Pulsed laser-deposited MoS2 thin films on W and Si: Field emission and photoresponse studies

ACS Applied Materials and Interfaces

Volumn 6, Issue 18, 2014, Pages 15881-15888

  Late, Dattatray J ^a,b   Shaikh, Parvez A ^a   Khare, Ruchita ^c   Kashid, Ranjit V ^c   Chaudhary, Minakshi ^a   More, Mahendra A ^c   Ogale, Satishchandra B ^a,b  

^a NATIONAL CHEMICAL LABORATORY   (India)

^b ACADEMY OF SCIENTIFIC AND INNOVATIVE RESEARCH ACSIR   (India)

^c UNIVERSITY OF PUNE   (India)

Author keywords

Field emission; MoS2; Photodiode heterostructures; Pulsed laser deposition; Thin film

Indexed keywords

ELECTRIC FIELDS; ELECTRON EMISSION; FIELD EMISSION; LAYERED SEMICONDUCTORS; MOLYBDENUM COMPOUNDS; MORPHOLOGY; PHOTODIODES; PULSED LASER DEPOSITION; PULSED LASERS; SHOTCRETING; SILICON; SUBSTRATES; SULFUR COMPOUNDS;

EMISSION CURRENT DENSITY; FIELD ELECTRON EMISSIONS; LARGE EMISSION CURRENTS; LOCAL ELECTRIC FIELD; MOLYBDENUM DISULFIDE; MOS2; NANOELECTRONIC DEVICES; NANOSTRUCTURED MORPHOLOGY;

THIN FILMS;

EID: 84912032786     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am503464h     Document Type: Article

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