Plasmonic tuning of aluminum doped zinc oxide nanostructures by atomic layer deposition

Physica Status Solidi - Rapid Research Letters

Volumn 8, Issue 11, 2014, Pages 948-952

  Riley, Conor T ^a   Kieu, Tien A ^a   Smalley, Joseph S T ^b   Pan, Si Hui Athena ^b   Kim, Sung Joo ^c   Post, Kirk W ^d   Kargar, Alireza ^d   Basov, Dimitri N ^d   Pan, Xiaoqing ^c   Fainman, Yeshaiahu ^b,d   Wang, Deli ^b,d   Sirbuly, Donald J ^a,d  

^a UNIVERSITY OF CALIFORNIA SAN DIEGO   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF MICHIGAN   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aluminum doping; Atomic layer deposition; Nanosphere lithography; Plasmonics; Silicon nanopillars; Zinc oxide

Indexed keywords

ALUMINUM COATINGS; ALUMINUM OXIDE; ATOMS; II-VI SEMICONDUCTORS; INFRARED DEVICES; NANOSTRUCTURES; OPTICAL FILMS; PLASMONICS; PLASMONS; SEMICONDUCTOR DOPING; SURFACE PLASMON RESONANCE; TRANSPARENT CONDUCTING OXIDES; ZINC OXIDE;

ALUMINUM DOPING; ALUMINUM-DOPED ZINC OXIDE; DEPOSITION TEMPERATURES; DOPING CONCENTRATION; LOCALIZED SURFACE PLASMON RESONANCE; NANO SPHERE LITHOGRAPHY; NANOSTRUCTURE MORPHOLOGIES; SILICON NANOPILLARS;

ATOMIC LAYER DEPOSITION;

EID: 84910643254     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201409359     Document Type: Article

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