Solution flow rate influence on properties of copper oxide thin films deposited by ultrasonic spray pyrolysis

Materials Science in Semiconductor Processing

Volumn 30, Issue , 2015, Pages 645-650

  Lamri Zeggar, M ^a   Chabane, L ^b   Aida, M S ^a   Attaf, N ^a   Zebbar, N ^b  

^a Universite Mentouri Constantine   (Algeria)

^b UNIVERSITY OF SCIENCES AND TECHNOLOGY HOUARI BOUMEDIENE   (Algeria)

Author keywords

Semiconductor oxides; Solar cells; Spray pyrolysis; Thin films

Indexed keywords

CARRIER CONCENTRATION; COPPER; COPPER OXIDES; CRYSTALLITE SIZE; FLOW RATE; HALL MOBILITY; HETEROJUNCTIONS; OPTICAL PROPERTIES; OXIDE FILMS; PYROLYSIS; SOLAR CELLS; SPRAY PYROLYSIS; SUBSTRATES; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION;

COPPER OXIDE THIN FILMS; ELECTRICAL CONDUCTIVITY; HALL EFFECT MEASUREMENT; HETEROJUNCTION STRUCTURES; SEMICONDUCTOR OXIDES; THIN-FILM PROPERTIES; ULTRASONIC SPRAY PYROLYSIS; UV VISIBLE SPECTROSCOPY;

THIN FILMS;

EID: 84908474497     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2014.09.026     Document Type: Article

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