Copper oxide thin films prepared from copper dipivaloylmethanate and oxygen by chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 7, 1998, Pages 4099-4102

  Maruyama, Toshiro ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Copper dipivaloylmethanate; Copper oxide; Energy gap; Thin film

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER COMPOUNDS; OXYGEN; THIN FILMS;

ENERGY GAP;

COPPER OXIDES;

EID: 0032115478     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4099     Document Type: Article

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