Deposition of tin(II) sulfide thin films by ultrasonic spray pyrolysis: Evidence of sulfur exo-diffusion

Materials Science in Semiconductor Processing

Volumn 17, Issue , 2014, Pages 38-42

  Messaoudi, M ^a   Aida, M S ^a   Attaf, N ^a   Bezzi, T ^a   Bougdira, J ^b   Medjahdi, G ^b  

^a Universite Mentouri Constantine   (Algeria)

^b UNIVERSITÉ DE LORRAINE   (France)

Author keywords

Spray pyrolysis; Sulfide; Thin films; Tin

Indexed keywords

DEPOSITION TIME; GAS FORMATION; GLASS SUBSTRATES; SULFIDE; SULFIDE THIN FILMS; TIN SULFIDE; ULTRASONIC SPRAY PYROLYSIS; ULTRASONIC SPRAY PYROLYSIS TECHNIQUE;

FILM GROWTH; SCANNING ELECTRON MICROSCOPY; SPRAY PYROLYSIS; SUBSTRATES; SULFUR COMPOUNDS; THIN FILMS; TIN; ULTRASONIC TESTING;

DEPOSITION;

EID: 84884313327     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2013.08.004     Document Type: Article

References (21)

1. N. Koteeswara Reddy, K. Ramesh, R. Ganesan, K.T.R. Reddy, K.R. Gunasekhar, and E.S.R. Gopal Applied Physics A 83 2006 133
2. S. Cheng, Y. Chen, C. Huang, and G. Chen Thin Solid Films 500 2006 96
3. N. Sato, M. Ichimura, E. Araia, and Y. Yamazaki Solar Energy Materials and Solar Cells 85 2005 153
4. P.A. Nwofe, K.T. Ramakrishna Reddya, G. Sreedevi, J.K. Tana, I. Forbes, and R.W. Miles Energy Procedia A15 2012 354
5. S.S. Hegde, A.G. Kunjomana, K. Ramesh, K.A. Chandrasekharan, and M. Prashantha International Journal of Soft Computing and Engineering (IJSCE) 1 2011 2231
6. M.T.S. Nair, and P.K. Nair Semiconductor Science and Technology 6 1991 132
7. C. Cifuentes, M. Botero, E. Romero, C. Calderon, and G. Gordillo Brazilian Journal of Physics 36 2006 3
8. G.H. Yue, W. Wang, L.S. Wang, X. Wang, P.X. Yan, Y. Chen, and D.L. Peng Journal of Alloys and Compounds 474 2009 445
9. B. Ghosh, M. Das, P. Banerjee, and S. Das Applied Surface Science 254 2008 6436
10. A. Tanusevski, and D. Poelman Solar Energy Materials and Solar Cells 80 2003 297
11. E. Guneri, C. Gumus, F. Mansur, and F. Kirmizigul Journal of Optoelectronics and Advanced Materials 3 2009 383
12. R. Mariappan, T. Mahalingam, and V. Ponnuswamy Optik 122 2011 2216
13. G.H. Yuea, W. Wanga, L.S. Wanga, X. Wanga, P.X. Yanb, Y. Chena, and D.L. Peng Journal of Alloys and Compounds 474 2009 445
14. L.L. Cheng, M.H. Liu, M.X. Wang, S.C. Wang, G.D. Wang a, Q.Y. Zhou, and Z.Q. Chen Journal of Alloys and Compounds 545 2012 122
15. S. Cheng, and G. Conibeer Thin Solid Films 520 2011 837
16. T.H. Sajeesh, A.R. Warrier, C.S. Kartha, and K.P. Vijayakumar. Thin Solid Films 518 2010 4370
17. O. Ogah, K.R. Reddy, G. Zoppi, I. Forbes, and R.W. Miles Thin Solid Films 519 2011 7425
18. H. Wiedemeier, and F.J. Csillag Zeitschrift für Kristallographie 149 1979 17
19. H.L. Zhu, D.R. Yang, Y.J. Ji, H. Zhang, and X.F. Shen Journal of Materials Science 40 2005 591
20. B. Ghosh, R. Bhattacharjee, P. Banerjee, and S. Das Applied Surface Science 257 2011 3670
21. M. Devika, N. Reddy, K. Ramesh, K.R. Gunasekhar, E.S.R. Gopal, and K.T.R. Reddy Semiconductor Science and Technology 21 2006 1125