Optical parameters induced by phase transformation in RF magnetron sputtered TiO2 nanostructured thin films

Progress in Natural Science: Materials International

Volumn 24, Issue 3, 2014, Pages 218-225

  Nair, Prabitha B ^a   Justinvictor, V B ^a   Daniel, Georgi P ^a   Joy, K ^a   James Raju, K C ^b   Devraj Kumar, David ^c   Thomas, P V ^a  

^a MAR IVANIOS COLLEGE   (India)

^b UNIVERSITY OF HYDERABAD   (India)

^c FLORIDA ATLANTIC UNIVERSITY   (United States)

Author keywords

Dislocation density; Optical conductivity; Photoluminescence; RF magnetron sputtering; TiO2 thin films

Indexed keywords

AMORPHOUS FILMS; ANNEALING; DISPLAY DEVICES; ENERGY GAP; MAGNETRON SPUTTERING; OPTICAL CONDUCTIVITY; OPTICAL FILMS; OXIDE MINERALS; PHASE TRANSITIONS; REFRACTIVE INDEX; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; TRANSPARENCY; X RAY DIFFRACTION;

ANATASE PHASIS; AS-DEPOSITED FILMS; DISLOCATIONS DENSITIES; NANOSTRUCTURED THIN FILM; OPTICAL PARAMETER; PHASES TRANSFORMATION; R.F. MAGNETRON SPUTTERING; THERMAL-ANNEALING; TIO 2 THIN FILM; VISIBLE REGION;

PHOTOLUMINESCENCE;

EID: 84908206645     PISSN: 10020071     EISSN: 17455391     Source Type: Journal    
DOI: 10.1016/j.pnsc.2014.05.010     Document Type: Article

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