Structural and morphological investigations of TiO2 sputtered thin films

Journal of Electrical Engineering

Volumn 60, Issue 6, 2009, Pages 354-357

  Hotový, Ivan ^a   Pullmannová, Andrea ^a   Predanocy, Martin ^a   Hotový, Juraj ^a   Řeháček, Vlastimil ^a   Kups, Thomas ^b   Spiess, Lothar ^b  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

DC magnetron sputtering; Morphological properties; Structure; TiO2 thin films

Indexed keywords

EID: 70849129280     PISSN: 13353632     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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