Effect of RF power and sputtering pressure on the structural and optical properties of TiO 2 thin films prepared by RF magnetron sputtering

Applied Surface Science

Volumn 257, Issue 24, 2011, Pages 10869-10875

  Nair, Prabitha B ^a   Justinvictor, V B ^a   Daniel, Georgi P ^a   Joy, K ^a   Ramakrishnan, V ^b   Thomas, P V ^a  

^a MAR IVANIOS COLLEGE   (India)

^b MADURAI KAMARAJ UNIVERSITY   (India)

Author keywords

Optical properties; Photoluminescence; Quantum size effect; RF magnetron sputtering

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ENERGY GAP; MAGNETRON SPUTTERING; OPTICAL BAND GAPS; OPTICAL PROPERTIES; OXIDE MINERALS; PHOTOLUMINESCENCE; PHOTOLUMINESCENCE SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM DIOXIDE; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION;

EXTINCTION COEFFICIENTS; MICRO-RAMAN ANALYSIS; OPTICAL QUALITIES; QUANTUM SIZE EFFECTS; RF-MAGNETRON SPUTTERING; SPUTTERING PRESSURES; STRUCTURAL AND OPTICAL PROPERTIES; UV-VIS SPECTROSCOPY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 80052943062     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.07.125     Document Type: Article

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