SCOPUS 정보 검색 플랫폼

Volumn 123, Issue , 2014, Pages 175-179

High throughput grating qualification of directed self-assembly patterns using optical metrology

(8) Van Look, Lieve a Rincon Delgadillo, Paulina a,b,c Lee, Yu Tsung a Pollentier, Ivan a Gronheid, Roel a Cao, Yi d Lin, Guanyang d Nealey, Paul F c

a IMEC (Belgium)

b UNIVERSITY OF LEUVEN (Belgium)

c UNIVERSITY OF CHICAGO (United States)

d AZ Electronic Materials (United States)

Author keywords

Chemo epitaxy; Directed self assembly; Line space patterns; Metrology

Indexed keywords

MEASUREMENTS; METEOROLOGICAL INSTRUMENTS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; THROUGHPUT; UNITS OF MEASUREMENT;

AUTOMATED DATA PROCESSING; CHEMO-EPITAXY; DIRECTED SELF-ASSEMBLY; FREQUENCY MULTIPLICATION; LINE/SPACE PATTERNS; MATERIAL OPTIMIZATION; SELF ASSEMBLED STRUCTURES; STATISTICAL INFORMATION; HIGH THROUGHPUT; OPTICAL METROLOGY;

SELF ASSEMBLY; MEASUREMENTS;

EID: 84907321735 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2014.08.008 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.