Integration of polymer self-assembly for lithographic application

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Cheng, Joy Y ^a   Sanders, Daniel P ^a   Kim, Ho Cheol ^a   Sundberg, Linda K ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Block copolymer; Directed self assembly; Process compatibility; Self assembly

Indexed keywords

CROSSLINKED; DIMENSIONAL CONTROL; DIRECTED SELF-ASSEMBLY; LITHOGRAPHIC PROCESS; MANUFACTURING PROCESS; PATTERNING TECHNIQUES; POLYMER SELF-ASSEMBLY; PROCESS COMPATIBILITY; SELF-ASSEMBLED; UNDERLAYERS;

BLOCK COPOLYMERS; COPOLYMERIZATION; INTEGRATION; POLYMERS; POLYSTYRENES; STANDARDS;

SELF ASSEMBLY;

EID: 70350049437     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773247     Document Type: Conference Paper

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