SCOPUS 정보 검색 플랫폼

Volumn 26, Issue 2, 2013, Pages 147-152

High throughput grating qualification for rating directed self-assembly pattern performance using optical metrology

a IMEC (Belgium)

Author keywords

Chemo epitaxy; Directed self assembly; Line space patterns; Metrology

Indexed keywords

EID: 84881525855 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.26.147 Document Type: Article

Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.