Thermodynamic study of β-Ga2O3growth by halide vapor phase epitaxy

Journal of Crystal Growth

Volumn 405, Issue , 2014, Pages 19-22

  Nomura, Kazushiro ^a   Goto, Ken ^b   Togashi, Rie ^a   Murakami, Hisashi ^a   Kumagai, Yoshinao ^a   Kuramata, Akito ^b   Yamakoshi, Shigenobu ^b   Koukitu, Akinori ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^b TAMURA CORPORATION   (Japan)

Author keywords

A1. Thermodynamic analysis A3. Halide vapor phase epitaxy B1. Oxides B1. Gallium compounds B2. Semiconducting III VI materials

Indexed keywords

HALIDE VAPOR PHASE EPITAXY; THERMODYNAMIC STUDIES;

EID: 84906964634     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2014.06.051     Document Type: Article

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