Optimization of long-range order in solvent vapor annealed poly(styrene)- block -poly(lactide) thin films for nanolithography

ACS Applied Materials and Interfaces

Volumn 6, Issue 16, 2014, Pages 13770-13781

  Baruth, A ^a,b   Seo, Myungeun ^a,c   Lin, Chun Hao ^a   Walster, Kern ^a   Shankar, Arjun ^a   Hillmyer, Marc A ^a   Leighton, C ^a  

^a University of Minnesota   (United States)

^b CREIGHTON UNIVERSITY   (United States)

^c Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

block copolymer; lithography; nanodot array; self assembly; small angle X ray scattering; solvent vapor annealing

Indexed keywords

ANNEALING; BLOCK COPOLYMERS; CRYSTAL ORIENTATION; CYLINDERS (SHAPES); LITHOGRAPHY; NANODOTS; NANOLITHOGRAPHY; NANOSTRUCTURED MATERIALS; SELF ASSEMBLY; SINGLE CRYSTALS; SOLVENTS; STYRENE; X RAY SCATTERING;

ANNEALING CONDITION; BLOCK COPOLYMER THIN FILMS; CYLINDER ORIENTATIONS; LATERAL CORRELATION LENGTH; NANO-DOT ARRAYS; SOLVENT CONCENTRATION; SOLVENT VAPOR PRESSURE; SOLVENT-VAPOR ANNEALING;

THIN FILMS;

EID: 84906819061     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am503199d     Document Type: Article

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