Plasmonic formation mechanism of periodic 100-nm-structures upon femtosecond laser irradiation of silicon in water

Journal of Applied Physics

Volumn 116, Issue 7, 2014, Pages

  Derrien, T J Y ^a   Koter, R ^a   Kruger J ^a   Hohm S ^b   Rosenfeld, A ^b   Bonse, J ^a  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

^b MAX BORN INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE POLARIZATION; FOURIER ANALYSIS; IRRADIATION; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACE PLASMON RESONANCE; ULTRAFAST LASERS;

ABLATION THRESHOLDS; FORMATION MECHANISM; LASER POLARIZATION; LASER-INDUCED PERIODIC SURFACE STRUCTURES; LOW-SPATIAL FREQUENCY; SURFACE PLASMON POLARITONS; TI:SAPPHIRE FEMTOSECOND LASERS; WATER ENVIRONMENTS;

ULTRASHORT PULSES;

EID: 84906569370     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4887808     Document Type: Article

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