Probing the heat affected zone by chemical modifications in femtosecond pulse laser ablation of titanium nitride films in air

Journal of Applied Physics

Volumn 107, Issue 5, 2010, Pages

  Bonse, Jörn ^a   Krüger, Jörg ^a  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION THRESHOLDS; AIR ENVIRONMENT; CHEMICAL ALTERATION; CHEMICAL STATE; ELEMENTAL DISTRIBUTION; FEMTOSECOND LASER ABLATION; FEMTOSECOND LASER PULSE; FEMTOSECOND PULSE LASER ABLATION; FLUENCES; IRRADIATED SURFACE; LASER FLUENCES; NEW APPROACHES; SCANNING AUGER ELECTRON MICROSCOPIES; SPATIAL DISTRIBUTION; SUPERFICIAL OXIDATION; SURFACE ANALYTICAL METHODS; SURFACE SPUTTERING; TIO; TITANIUM NITRIDE FILMS;

CHEMICAL ELEMENTS; CHEMICAL MODIFICATION; DEPTH PROFILING; ELECTROMAGNETIC PULSE; HEAT AFFECTED ZONE; LASER ABLATION; LASER CHEMISTRY; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SIZE DISTRIBUTION; SURFACES; TITANIUM; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRASHORT PULSES;

EID: 77949720330     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3311552     Document Type: Article

References (22)

1. E. Matthias, M. Reichling, J. Siegel, O. W. Käding, S. Petzoldt, H. Skurk, P. Bizenberger, and E. Neske, Appl. Phys. A: Mater. Sci. Process. 58, 129 (1994).
2. S. I. Anisimov, B. L. Kapeliovich, and T. L. Perel'man, Sov. Phys. JETP 39, 375 (1974).
3. P. B. Corkum, F. Brunel, N. K. Sherman, and T. Srinivasan-Rao, Phys. Rev. Lett. 61, 2886 (1988).
4. S.-S. Wellershoff, J. Hohlfeld, J. Güdde, and E. Matthias, Appl. Phys. A: Mater. Sci. Process. 69, S99 (1999).
5. A. Luft, U. Franz, A. Emsermann, and J. Kaspar, Appl. Phys. A: Mater. Sci. Process. 63, 93 (1996).
6. A. Borowiec, M. Couillard, G. A. Botton, and H. K. Haugen, Appl. Phys.A: Mater. Sci. Process. 79, 1887 (2004).
7. J. Bonse, A. Rosenfeld, C. Grebing, G. Steinmeyer, N. Mailman, G. A. Botton, and H. K. Haugen, J. Appl. Phys. 106, 074907 (2009).
8. Y. Hirayama and M. Obara, J. Appl. Phys. 97, 064903 (2005).
9. J. Bonse, K.-W. Brzezinka, and A. J. Meixner, Appl. Surf. Sci. 221, 215 (2004).
10. J. Bonse, Appl. Phys. A: Mater. Sci. Process. 84, 63 (2006).
11. J. Bonse, S. M. Wiggins, and J. Solis, J. Appl. Phys. 96, 2352 (2004).
12. J. Krüger, D. Dufft, R. Koter, and A. Hertwig, Appl. Surf. Sci. 253, 7815 (2007).
13. S. Valette, R. Le Harzic, N. Huot, E. Audouard, and R. Fortunier, Appl. Surf. Sci. 247, 238 (2005).
14. L. Soriano, M. Abbate, H. Pen, P. Prieteo, and J. M. Sanz, Solid State Commun. 102, 291 (1997).
15. J. E. Sundgren and H. T. G. Hentzell, J. Vac. Sci. Technol. A 4, 2259 (1986).
16. A. Mumtaz and W. H. Class, J. Vac. Sci. Technol. 20, 345 (1982).
17. J. Bonse, M. Geu, S. Baudach, H. Sturm, and W. Kautek, Appl. Phys. A: Mater. Sci. Process. 69, S399 (1999).
18. J. Bonse, P. Rudolph, J. Krüger, S. Baudach, and W. Kautek, Appl. Surf. Sci. 154-155, 659 (2000).
19. J. Bonse, H. Sturm, D. Schmidt, and W. Kautek, Appl. Phys. A: Mater. Sci. Process. 71, 657 (2000).
20. I. Milošv, H.-H. Strehblow, B. Navinšek, and M. Metikoš-Hukovic, Surf. Interface Anal. 23, 529 (1995).
21. G. Meier zu Köcker, T. Gross, and E. Santner, Wear 179, 5 (1994).
22. M. Li, W. Hebenstreit, U. Diebold, A. M. Tyryshkin, M. K. Bowman, G. G. Dunham, and M. A. Henderson, J. Phys. Chem. B 104, 4944 (2000).