Femtosecond-pulse visible laser processing of transparent materials

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 430-438

  Kruger J ^a   Kautek, W ^a  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; DIELECTRIC MATERIALS; ELECTRON ABSORPTION; FUSED SILICA; GLASS; HIGH POWER LASERS; LASER ABLATION; LASER BEAM EFFECTS; LASER PULSES; MORPHOLOGY;

FEMTOSECOND PULSE VISIBLE LASER PROCESSING; MULTIPHOTON ABSORPTION; PHOTON ABSORPTION MECHANISMS; SILICATE GLASSES; THRESHOLD FLUENCES; TRANSIENT MATERIALS;

LASER APPLICATIONS;

EID: 0030562966     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00446-7     Document Type: Article

References (37)

1. N. Bloembergen, IEEE J. Quantum Electron. QE-10 (1974) 375.
2. Laser-Induced Damage in Optical Materials, Proc. of the Boulder Damage Symp., Vols. 1-25 (Natl. Inst. Stand. Technol., Gaitherburg, 1969-1993).
3. R.M. Wood, Laser Damage in Optical Materials (Hilger, Boston, 1986).
4. E. Welsch, K. Mann, M. Reichling and K. Ettrich, SPIE Vol. 2114 (1993) 366.
5. B.C. Stuart, M.D. Feit, A.M. Rubenchik, B.W. Shore and M.D. Perry, Phys. Rev. Lett. 74 (1995) 2248.
6. J. Ihlemann, B. Wolff and P. Simon, Appl. Phys. A 54 (1992) 363.
7. W. Kautek and J. Krüger, SPIE 2207 (1994) 600.
8. J. Krüger and W. Kautek, SPIE Vol. 2403 (1996), in print.
9. M.D. Perry and G. Mourou, Science 264 (1994) 917.
10. D. Du, X. Liu, G. Korn, J. Squier and G. Mourou, Appl. Phys. Lett. 64 (1994) 3071.
11. Y. Kawamura, K. Toyoda and S. Namba, Appl. Phys. Lett. 40 (1982) 374; J. Appl. Phys. 53 (1982) 6489.
12. Y. Kawamura, K. Toyoda and S. Namba, Appl. Phys. Lett. 40 (1982) 374; J. Appl. Phys. 53 (1982) 6489.
13. R. Srinivasan and V. Mayne-Banton, Appl. Phys. Lett. 41 (1982) 576.
14. H.H.G. Jellinek and R. Srinivasan, J. Phys. Chem. 88 (1984) 3048.
15. J.H. Brannon, J.R. Lankard, A.I. Baise, F. Burns and J. Kaufman, J. Appl. Phys. 58 (1985) 2036.
16. L.I. Kalantarov and R. Marupov, Chem. Phys. Lett. 196 (1992) 15.
17. R. Kelly, A. Miotello, B. Braren, A. Gupta and K. Casey, Nucl. Instr. Meth. B 65 (1992) 187.
18. S.R. Cain, F.C. Burns, C.E. Otis and B. Braren, J. Appl. Phys. 72 (1992) 5172.
19. S. Cain, J. Phys. Chem. 97 (1993) 7572.
20. B. Lukyanchuk, N. Bituryn, S. Anisimov and D. Bäuerle, Appl. Phys. A 57 (1993) 367 and 449.
21. G.C. D'Couto and S.V. Babu, J. Appl. Phys. 76 (1994) 3052.
22. S. Küper and M. Stuke, Appl. Phys. B 44 (1987) 199.
23. N.P. Furzikov, Sov. Tech. Phys. Lett. 16 (1990) 4; Appl. Phys. Lett. 56 (1990) 1638; Sov. J. Quantum Electron. 20 (1990) 549.
24. N.P. Furzikov, Sov. Tech. Phys. Lett. 16 (1990) 4; Appl. Phys. Lett. 56 (1990) 1638; Sov. J. Quantum Electron. 20 (1990) 549.
25. N.P. Furzikov, Sov. Tech. Phys. Lett. 16 (1990) 4; Appl. Phys. Lett. 56 (1990) 1638; Sov. J. Quantum Electron. 20 (1990) 549.
26. G.H. Pettit and R. Sauerbrey, Appl. Phys. A 56 (1993) 51.
27. S. Preuss, M. Späth, Y. Zhang and M. Stuke, Appl. Phys. Lett. 62 (1993) 3049.
28. M.J. LaGasse, K.K. Anderson, H.A. Haus and J.G. Fujimoto, Appl. Phys. Lett. 54 (1989) 2068.
29. W. Rudolph, J. Puls, F. Henneberger and D. Lap, Phys. Status Solidi (b) 159 (1990) 49.
30. K.K. Anderson, M.J. LaGasse, C.A. Wang, J.G. Fujimoto and H.A. Haus, Appl. Phys. Lett. 56 (1990) 1834.
31. E.C. Fox, E. Canto-Said and H.M. van Diel, SPIE Vol. 1677 (1992) 184.
32. M.C. Downer and C.V. Shank, Phys. Rev, Lett. 56 (1986) 761.
33. H.E. Swoboda, F.A. Majumder, V.G. Lyssenko, C. Klingshirn and L. Banyai, Z. Phys. B 70 (1988) 341.
34. T. Gong, W.L. Nighan, Jr. and P.M. Fauchet, Appl. Phys. Lett. 57 (1990) 2713.
35. S. Küper and M. Stuke, Appl. Phys. Lett. 54 (1989) 4.
36. D.H. Levy, K.K. Gleason, M. Rothschild and J.H.C. Sedlacek, J. Appl. Phys. 73 (1993) 2809.
37. W. Kautek, S. Mitterer, J. Krüger, VV. Husinsky and G. Grabner, Appl. Phys. A 58 (1994) 513.