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Volumn 2, Issue 36, 2014, Pages 7570-7574

Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

EID: 84906552426     PISSN: 20507534     EISSN: 20507526     Source Type: Journal    
DOI: 10.1039/c4tc00849a     Document Type: Article
Times cited : (47)

References (36)
  • 13
    • 67649225738 scopus 로고    scopus 로고
    • A. K. Geim Science 2009 324 1530
    • (2009) Science , vol.324 , pp. 1530
    • Geim, A.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.