A soft photo-mask with embedded carbon black and its application in contact photolithography

Journal of Micromechanics and Microengineering

Volumn 24, Issue 8, 2014, Pages

  Hsieh, Yi Ta ^a   Hsieh, Heng ^a   Lee, Yung Chun ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

carbon black; contact photolithography; patterned sapphire substrate; photo resist; soft photo mask; ultraviolet patterning

Indexed keywords

CARBON BLACK; MICROCHANNELS; MOLDS; PHOTOLITHOGRAPHY; SAPPHIRE; SILICONES; SUBSTRATES;

CONTACT TRANSFER; CURVED SUBSTRATES; HIGH THROUGHPUT; ITS APPLICATIONS; PATTERNED SAPPHIRE SUBSTRATE; POLYDIMETHYLSILOXANE PDMS; SOFT PHOTO-MASK; ULTRAVIOLET PATTERNING;

LIGHT EMITTING DIODES;

EID: 84906094136     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/24/8/085006     Document Type: Article

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