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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 6, 2010, Pages

Multilayer pattern transfer for plasmonic color filter applications

(4) Kaplan, Alex F a Xu, Ting a,b Wu, Yi Kuei a Guo, L Jay a

a UNIVERSITY OF MICHIGAN (United States)

b INSTITUTE OF OPTICS AND ELECTRONICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; FLIGHT DYNAMICS; LITHOGRAPHY; METAL INSULATOR BOUNDARIES; MOLDS; SILICON COMPOUNDS; SUBSTRATES;

COLOR FILTERS; CONTACT PRINTING; DISPLAY APPLICATION; METAL LAYER; METAL-INSULATOR-METAL STRUCTURES; MULTILAYER PATTERNS; MULTIPLE LAYERS; PLASMONIC; POLYCARBONATE SUBSTRATES; PROCESSING TECHNIQUE; ROLL TO ROLL; UNIFORM PRESSURE; VARIOUS SUBSTRATES;

MIM DEVICES;

EID: 84905953192 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3511430 Document Type: Article

Times cited : (21)

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