Imaging solutions for the 22nm node using 1.35NA

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Engelen, André ^a   Mulder, Melchior ^a   Bouchoms, Igor ^a   Hansen, Steve ^b   Bouma, Anita ^a   Ngai, Anthony ^a   Van Veen, Marieke ^a   Zimmermann, Jörg ^c  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

Extreme dipole illumination; Freeform illumination; Source mask optimization; TE polarization

Indexed keywords

ACTIVE AREA; CD CONTROL; DESIGN FOR MANUFACTURING; DIPOLE ILLUMINATION; DOUBLE PATTERNING; EXTREME DIPOLE ILLUMINATION; FREEFORM; FREEFORM ILLUMINATION; GATE LAYERS; IMAGING SOLUTIONS; IMMERSION LIQUIDS; PATTERN FIDELITY; POLARIZATION STATE; PROCESS WINDOW; RING WIDTH; SINGLE EXPOSURE; SOURCE MASK OPTIMIZATION; TE POLARIZATION; TECHNOLOGY NODES;

MASKS; NANOTECHNOLOGY;

POLARIZATION;

EID: 65849159064     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814155     Document Type: Conference Paper

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