Effects of the morphology of inkjet printed zinc oxide (ZnO) on thin film transistor performance and seeded ZnO nanorod growth

Thin Solid Films

Volumn 544, Issue , 2013, Pages 509-514

  Liang, Yen Nan ^a   Lok, Boon Keng ^b   Wang, Libo ^c   Feng, Chengang ^c   Lu, Albert Chee Wai ^b   Mei, Ting ^c   Hu, Xiao ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Coffee ring; Hydrothermal nanorod growth; Inkjet printing; Thin film transistor; Zinc oxide

Indexed keywords

CRYSTALLIZATION; FIELD EFFECT TRANSISTORS; FILM GROWTH; INK; INK JET PRINTING; MORPHOLOGY; NANORODS; NANOTECHNOLOGY; NUCLEATION; PRINTING; SOL-GELS; THIN FILM DEVICES; THIN FILM TRANSISTORS; THIN FILMS; ZINC; ZINC OXIDE;

COFFEE RINGS; CRYSTALLIZATION BEHAVIOR; HETEROGENEOUS NUCLEATION; HYDROTHERMAL GROWTH; NANOROD GROWTH; SOL-GEL PRECURSORS; SURFACTANT DISTRIBUTION; THIN-FILM TRANSISTOR (TFTS);

THIN FILM CIRCUITS;

EID: 84901841808     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.01.032     Document Type: Conference Paper

References (46)

1. Q. Wan, Q. H. Li, Y. J. Chen, T. H. Wang, X. L. He, J. P. Li, C. L. Lin, Appl. Phys. Lett. 84 (2004) 3654.
2. H. M. Xiong, Y. Xu, Q. G. Ren, Y. Y. Xia, J. Am. Chem. Soc. 130 (2008) 7522.
3. B. S. Ong, C. Li, Y. Li, Y. Wu, R. Loutfy, J. Am. Chem. Soc. 129 (2007) 2750.
4. W. Tang, D. C. Cameron, Thin Solid Films 238 (1994) 83.
5. M. Izaki, S. Watase, H. Takahashi, Appl. Phys. Lett. 83 (2003) 4930.
6. P. Suresh, P. Balaraju, S. K. Sharma, M. S. Roy, G. D. Sharma, Sol. Energy Mater. Sol. Cells 92 (2008) 900.
7. Y. Ohya, H. Saiki, T. Tanaka, Y. Takahashi, J. Am. Chem. Soc. 79 (1996) 825.
8. L. Vayssieres, K. Keis, S. E. Lindquist, A. Hagfeldt, J. Phys. Chem. B 105 (2001) 3350.
9. D. Gal, G. Hodes, D. Lincot, H. W. Schock, Thin Solid Films 361 (2000) 79.
10. B. Sun, H. Sirringhaus, Nano Lett. 5 (2005) 2408.
11. B. B. Choi, N. Myung, K. Rajeshwar, Electrochem. Commun. 9 (2007) 1592.
12. Y. Zhang, K. Yu, S. Ouyang, Z. Zhu, Physica B 382 (2006) 76.
13. S. Kwon, J.-H. Park, J.-G. Park, J. Electroceram. 17 (2006) 455.
14. C. H. Wang, A. S. W. Wong, G. W. Ho, Langmuir 23 (2007) 11960.
15. K.-m. Lin, P. Tsai, Thin Solid Films 515 (2007) 8601.
16. B. J. de Gans, P. C. Duineveld, U. S. Schubert, Adv. Mater. 16 (2004) 203.
17. E. Tekin, P. J. Smith, U. S. Schubert, Soft Matter 4 (2008) 703.
18. T. Rivkin, C. Curtis, A. Miedaner, J. Perkins, J. Alleman, D. Ginley, Conference Record of the IEEE Photovoltaic Specialists Conference, 2002, p. 1326.
19. H. Sirringhaus, T. Kawase, R. H. Friend, T. Shimoda, M. Inbasekaran, W. Wu, E. P. Woo, Science 290 (2000) 2123.
20. A. Bietsch, J. Zhang, M. Hegner, H. P. Lang, C. Gerber, Nanotechnology 15 (2004) 873.
21. D. Soltman, V. Subramanian, Langmuir 24 (2008) 2224.
22. R. D. Deegan, O. Bakajin, T. F. Dupont, G. Huber, S. R. Nagel, T. A. Witten, Nature 389 (1997) 827.
23. H. Hu, R. G. Larson, J. Phys. Chem. B 110 (2006) 7090.
24. J. Park, J. Moon, Langmuir 22 (2006) 3506.
25. A. M. J. Van Den Berg, A. W. M. De Laat, P. J. Smith, J. Perelaer, U. S. Schubert, J. Mater. Chem. 17 (2007) 677.
26. J. A. Lim, W. H. Lee, H. S. Lee, J. H. Lee, Y. D. Park, K. Cho, Adv. Funct. Mater. 18 (2008) 229.
27. G. H. Kim, H. S. Kim, H. S. Shin, B. D. Ahn, K. H. Kim, H. J. Kim, Thin Solid Films 517 (2009) 4007.
28. D.-H. Lee, Y. J. Chang, G. S. Herman, C. H. Chang, Adv. Mater. 19 (2007) 843.
29. J. J. Schneider, R. C. Hoffmann, J. Engstler, O. Soffke, W. Jaegermann, A. Issanin, A. Klyszcz, Adv. Mater. 20 (2008) 3383.
30. C. Avis, J. Jang, J. Mater. Chem. 21 (2011) 10649.
31. S. T. Meyers, J. T. Anderson, C. M. Hung, J. Thompson, J. F. Wager, D. A. Keszler, J. Am. Chem. Soc. 130 (2008) 17603.
32. Y. Wu, T. Tamaki, T. Volotinen, L. Belova, K. V. Rao, J. Phys. Chem. Lett. 1 (2009) 89.
33. O. D. Jayakumar, A. K. Tyagi, J. Mater. Chem. 21 (2011) 12246.
34. Y. Wu, E. Girgis, V. Strom, W. Voit, L. Belova, K. V. Rao, Phys. Status Solidi A 208 (2011) 206.
35. Y. Y. Noh, X. Cheng, H. Sirringhaus, J. I. Sohn, M. E. Welland, D. J. Kang, Appl. Phys. Lett. 91 (2007) 043109.
36. W. Shen, Y. Zhao, C. Zhang, Thin Solid Films 483 (2005) 382.
37. C.-J. Chang, S.-T. Hung, C.-K. Lin, C.-Y. Chen, E.-H. Kuo, Thin Solid Films 519 (2010) 1693.
38. S. H. Ko, D. Lee, N. Hotz, J. Yeo, S. Hong, K. H. Nam, C. P. Grigoropoulos, Langmuir 28 (2012) 4787.
39. R. Kitsomboonloha, S. Baruah, M. T. Z. Myint, V. Subramanian, J. Dutta, J. Cryst. Growth 311 (2009) 2352.
40. M. T. Z. Myint, R. Kitsomboonloha, S. Baruah, J. Dutta, J. Colloid Interface Sci. 354 (2011) 810.
41. C. Avis, J. Jang, Electrochem. Solid-State Lett. 14 (2011) J9.
42. M. Ohyama, H. Kozuka, T. Yoko, S. Sakka, J. Ceram. Soc. Jpn. 104 (1996) 296.
43. D. Kim, Y. Jeong, K. Song, S.-K. Park, G. Cao, J. Moon, Langmuir 25 (2009) 11149.
44. V. Truskett, K. J. Stebe, Langmuir 19 (2003) 8271.
45. J.-H. Kim, S. I. Ahn, J. H. Kim, J. S. Kim, K. Cho, J. C. Jung, T. Chang, M. Ree, W.-C. Zin, Langmuir 24 (2008) 11442.
46. D. L. Logan, C. S. Ashley, C. Jeffrey Brinker, MRS Proc. 271 (1992) 541.