Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography

Nature Communications

Volumn 5, Issue , 2014, Pages

  Beesley, David J ^a   Semple, James ^a   Krishnan Jagadamma, Lethy ^b   Amassian, Aram ^b   McLachlan, Martyn A ^a   Anthopoulos, Thomas D ^a   Demello, John C ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVE AGENT; ALUMINUM; CHROMIUM; GLUE; GOLD; METAL; NANOCOATING; NANOMATERIAL; RESIN; SELF ASSEMBLED MONOLAYER;

ASYMMETRY; ELECTRODE; ELECTRONIC EQUIPMENT; METAL;

ADHESION; ADHESION LITHOGRAPHY; ARTICLE; DIODE; ELASTICITY; ELECTRICAL EQUIPMENT; ELECTROCHEMICAL ANALYSIS; FORCE; NANOFABRICATION; NANOGAP ELECTRODE; OPTOELECTRONIC DEVICE; PHYSICAL CHEMISTRY; PROCEDURES; RIGIDITY; ROOM TEMPERATURE;

EID: 84901502703     PISSN: None     EISSN: 20411723     Source Type: Journal    
DOI: 10.1038/ncomms4933     Document Type: Article

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