Fabrication of dissimilar metal electrodes with nanometer interelectrode distance for molecular electronic device characterization

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 3, 2000, Pages 1177-1181

  Guillorn, Michael A ^a   Carr, Dustin W ^b,d   Tiberio, Richard C ^b   Greenbaum, Elias ^c   Simpson, Michael L ^c  

^a UNIVERSITY OF TENNESSEE   (United States)

^b Cornell University   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

^d NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSIMILAR METALS; ELECTRODES; ELECTRON BEAM LITHOGRAPHY; GOLD;

DISSIMILAR METAL ELECTRODES; LIFTOFF PATTERN TRANSFER;

NANOTECHNOLOGY;

EID: 0034186905     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591355     Document Type: Article

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17. All electrical characterization of these structures was performed using a Hewlett-Packard 4156A precision semiconductor parameter analyzer and a Signatone S-250-6 probe station.
18. For more information on the Cornell Nanofabrication Facility and the National Nanofabrication User's Network refer to www.nnun.org