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Volumn 24, Issue 5, 2014, Pages 294-296

Accurate formulas for the capacitance of tapered-through silicon vias in 3-D ICs

Author keywords

3 D ICs; Capacitance; conformal mapping method; tapered through silicon vias (T TSVs)

Indexed keywords

CONFORMAL MAPPING; ELECTRIC FIELDS; INTEGRATED CIRCUITS; THREE DIMENSIONAL;

EID: 84901012321     PISSN: 15311309     EISSN: None     Source Type: Journal    
DOI: 10.1109/LMWC.2014.2309075     Document Type: Article
Times cited : (19)

References (8)
  • 1
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    • San Francisco, CA, Sept.
    • Z. Xu, A. Beece, K. Rose, T. Zhang, and J.-Q. Lu, "Modeling and evaluation for electrical characteristics of through-strata-vias (TSVs) in three-dimensional integration," in Proc. IEEE Int. 3-D Syst. Integr. Conf., San Francisco, CA, Sept. 2009, pp. 1-9.
    • (2009) Proc. IEEE Int. 3-D Syst. Integr. Conf. , pp. 1-9
    • Xu, Z.1    Beece, A.2    Rose, K.3    Zhang, T.4    Lu, J.-Q.5
  • 2
    • 84873897342 scopus 로고    scopus 로고
    • Modeling of crosstalk in through silicon vias
    • Feb.
    • A. E. Engin and S. R. Narasimhan, "Modeling of crosstalk in through silicon vias," IEEE Trans. Electromagn. Compat., vol. 55, no. 1, pp. 149-158, Feb. 2013.
    • (2013) IEEE Trans. Electromagn. Compat. , vol.55 , Issue.1 , pp. 149-158
    • Engin, A.E.1    Narasimhan, S.R.2
  • 4
    • 80052032494 scopus 로고    scopus 로고
    • High-speed design and broadband modeling of through-strata-vias (TSVs) in 3D integration
    • Feb.
    • Z. Xu and J.-Q. Lu, "High-speed design and broadband modeling of through-strata-vias (TSVs) in 3D integration," IEEE Trans. Comp., Packag. Manufact. Technol., vol. 1, no. 2, pp. 154-162, Feb. 2011.
    • (2011) IEEE Trans. Comp., Packag. Manufact. Technol. , vol.1 , Issue.2 , pp. 154-162
    • Xu, Z.1    Lu, J.-Q.2
  • 5
    • 79951949566 scopus 로고    scopus 로고
    • Closed-form expressions for the resistance and the inductance of different profiles of through-silicon vias
    • Mar.
    • Y. Liang and Y. Li, "Closed-form expressions for the resistance and the inductance of different profiles of through-silicon vias," IEEE Electron Device Lett., vol. 32, no. 3, pp. 393-395, Mar. 2011.
    • (2011) IEEE Electron Device Lett. , vol.32 , Issue.3 , pp. 393-395
    • Liang, Y.1    Li, Y.2
  • 6
    • 84893772949 scopus 로고    scopus 로고
    • Capacitance characterization of tapered through-silicon-via considering MOS effect
    • Feb.
    • F. Wang, Z. Zhu, Y. Yang, X. Liu, and R. Ding, "Capacitance characterization of tapered through-silicon-via considering MOS effect," Microelectron. J., vol. 45, no. 2, pp. 205-210, Feb. 2014.
    • (2014) Microelectron. J. , vol.45 , Issue.2 , pp. 205-210
    • Wang, F.1    Zhu, Z.2    Yang, Y.3    Liu, X.4    Ding, R.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.