Electrochemical deposition of subnanometer Ni films on TiN

Langmuir

Volumn 30, Issue 8, 2014, Pages 2047-2053

  Vanpaemel, Johannes ^a,b   Sugiura, Masahito ^c   Cuypers, Daniel ^a,b   Van Der Veen, Marleen H ^a   De Gendt, Stefan ^a,b   Vereecken, Philippe M ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING EXPERIMENTS; BULK DEPOSITIONS; CARBON NANOTUBE GROWTH; CONDUCTIVE SUBSTRATES; ELECTROCHEMICAL DEPOSITION; ELECTROLYTE SOLUTIONS; PARTICLE DENSITIES; ULTRATHIN NI FILMS;

DEPOSITION; ELECTRODEPOSITION; FILM GROWTH; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; NUCLEATION; REDUCTION; SECONDARY ION MASS SPECTROMETRY; SUBSTRATES; TITANIUM NITRIDE;

NICKEL;

EID: 84897694463     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la404852m     Document Type: Article

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