Nickel sulfur thin films deposited by ECALE: Electrochemical, XPS and AFM characterization

Journal of Electroanalytical Chemistry

Volumn 638, Issue 1, 2010, Pages 15-20

  Loglio, F ^a   Innocenti, M ^a   Jarek, A ^b   Caporali, S ^a   Pasquini, I ^a   Foresti, M L ^a  

^a UNIVERSITY OF FLORENCE   (Italy)

^b AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

AFM; ECALE; HER; Nickel sulfide; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; CYCLIC VOLTAMMETRY; ELECTROCATALYSIS; FILM PREPARATION; NICKEL; NICKEL ALLOYS; STRIPPING (DYES); SULFUR; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AFM; AG(1 1 1); ELECTROCATALYTIC PROPERTIES; ELECTROCHEMICAL ATOMIC LAYER EPITAXY; HYDROGEN EVOLUTION REACTIONS; MULTILAYER GROWTH; NICKEL SULFIDE; STRIPPING VOLTAMMETRY; XPS; XPS ANALYSIS;

SILVER;

EID: 72149129500     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2009.10.027     Document Type: Article

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