SCOPUS 정보 검색 플랫폼

Volumn 230, Issue , 2014, Pages 8-14

High-power pulsed plasma deposition of hematite photoanode for PEC water splitting

(14) Kment, S a Hubicka, Z b Krysa, J c Olejnicek, J b Cada, M b Gregora, I b Zlamal, M c Brunclikova, M b Remes, Z b Liu, N d Wang, L d Kirchgeorg, R d Lee, Ch Y d Schmuki, P d

a PALACKÝ UNIVERSITY (Czech Republic)

b INSTITUTE OF PHYSICS (Czech Republic)

c INSTITUTE OF CHEMICAL TECHNOLOGY (Czech Republic)

d UNIVERSITY OF ERLANGEN NUREMBERG (Germany)

Author keywords

Electrical properties; Hematite; HiPIMS; Hollow cathode plasma jet; Photoelectrochemical water splitting; Thin films

Indexed keywords

ANNEALING; CATHODES; DEPOSITION; ELECTROCHEMISTRY; ELECTRONIC PROPERTIES; HEMATITE; MAGNETRON SPUTTERING; THIN FILMS; TIN; TIN OXIDES;

FLUORINE DOPED TIN OXIDE; FUNCTIONAL PROPERTIES; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIPIMS; HOLLOW CATHODES; PHOTOELECTROCHEMICAL WATER SPLITTING; PULSED PLASMA DEPOSITION; REACTIVE DC MAGNETRON SPUTTERING;

ELECTRIC PROPERTIES;

EID: 84897582429 PISSN: 09205861 EISSN: None Source Type: Journal
DOI: 10.1016/j.cattod.2013.11.045 Document Type: Article

Times cited : (30)

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