Double hollow cathode plasma jet-low temperature method for the TiO2-xNx photoresponding films

Electrochimica Acta

Volumn 55, Issue 5, 2010, Pages 1548-1556

  Kment, S ^a   Kluson, P ^b   Hubicka, Z ^a   Krysa, J ^c   Cada, M ^a   Gregora, I ^a   Deyneka, A ^a   Remes, Z ^a   Zabova, H ^b   Jastrabik, L ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^c INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

Author keywords

Hollow cathode; IPCE; N doped titanium dioxide; Photocurrent; Thin layers

Indexed keywords

AFM; AMPEROMETRY; CHARACTERIZATION METHODS; HOLLOW CATHODES; IPCE; LIGHT BEAM; LOW TEMPERATURE METHOD; LOW TEMPERATURES; N-DOPED TITANIUM DIOXIDE; OPEN CIRCUIT POTENTIAL; PHOTOCURRENT GENERATIONS; PHOTOINDUCED PROPERTIES; PHOTOTHERMAL DEFLECTION SPECTROSCOPY; POLARIZATION CURVES; RF FIELDS; RF-POWER; SEM; SENSITIVE MATERIALS; THIN LAYERS; TIO; TRANSPARENT LAYERS; XRD;

CYCLIC VOLTAMMETRY; OPEN CIRCUIT VOLTAGE; OXIDES; PHOTOCURRENTS; PLASMA ACCELERATORS; PLASMA JETS; PLASMA SOURCES; RADIOFREQUENCY SPECTROSCOPY; RAMAN SPECTROSCOPY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 74549223155     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.10.017     Document Type: Article

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