SCOPUS 정보 검색 플랫폼

Organic Electronics

Volumn 15, Issue 5, 2014, Pages 977-983

Effect of oxygen plasma treatment on air exposed MoOx thin film

(5) Liu, Xiaoliang a,b Yi, Shijuan a Wang, Chenggong b Irfan, Irfan b Gao, Yongli b

a CENTRAL SOUTH UNIVERSITY (China)

b UNIVERSITY OF ROCHESTER (United States)

Author keywords

Metal oxide insertion layer; Oxygen plasma treatment; Photoemission spectroscopy

Indexed keywords

BINDING ENERGY; CHARGE INJECTION; FIELD EFFECT TRANSISTORS; METALS; MOLECULAR ORBITALS; MOLYBDENUM OXIDE; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PLASMA APPLICATIONS; RECOVERY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER PHTHALOCYANINE; ELECTRONIC ENERGY LEVELS; HIGHEST OCCUPIED MOLECULAR ORBITAL; HOLE EXTRACTION LAYERS; INSERTION LAYERS; OXYGEN PLASMA TREATMENTS; ULTRAVIOLET PHOTOEMISSION SPECTROSCOPY; X RAY PHOTOEMISSION SPECTROSCOPY;

COPPER COMPOUNDS;

EID: 84896801733 PISSN: 15661199 EISSN: None Source Type: Journal
DOI: 10.1016/j.orgel.2014.02.011 Document Type: Article

Times cited : (27)

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