Surface passivation and antireflection behavior of ALD TiO2 on n-type silicon for solar cells

International Journal of Photoenergy

Volumn 2013, Issue , 2013, Pages

  Yu, Ing Song ^a   Wang, Yu Wun ^b   Cheng, Hsyi En ^b   Yang, Zu Po ^c   Lin, Chun Tin ^c  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

^b SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; ATOMIC LAYER DEPOSITION; CARRIER LIFETIME; OXIDE MINERALS; PASSIVATION; REFRACTIVE INDEX; SILICON SOLAR CELLS; SILICON WAFERS; TEMPERATURE; THIN FILMS;

ANTIREFLECTION; ATOMIC-LAYER DEPOSITION; CONFORMAL DEPOSITION; N TYPE SILICON; PROPERTY; SELF-LIMITING GROWTHS; STEP COVERAGE; SURFACE PASSIVATION; TIO 2; TIO 2 THIN FILM;

TITANIUM DIOXIDE;

EID: 84893777023     PISSN: 1110662X     EISSN: 1687529X     Source Type: Journal    
DOI: 10.1155/2013/431614     Document Type: Article

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