SCOPUS 정보 검색 플랫폼

Volumn 156, Issue 8, 2009, Pages

Substrate materials and deposition temperature dependent growth characteristics and photocatalytic properties of ALD TiO2 films

(3) Cheng, Hsyi En a Hsu, Ching Ming a Chen, Yi Chih a

a SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE STRUCTURES; AS-DEPOSITED FILMS; COATED GLASS SUBSTRATES; COATED SUBSTRATES; DEPOSITED FILMS; DEPOSITION TEMPERATURES; GRAIN COALESCENCE; GRAIN SIZE; GROWTH CHARACTERISTIC; METHYLENE BLUE; NUCLEUS DENSITY; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC PROPERTY; SCHOTTKY CONTACTS; SUBSTRATE MATERIAL; TIO; TRANSITION TEMPERATURE;

ATOMIC LAYER DEPOSITION; COALESCENCE; COMPOSITE FILMS; CRYSTALLINE MATERIALS; GROWTH (MATERIALS); NICKEL; OXIDE MINERALS; PHOTOCATALYSIS; TANTALUM; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

SUBSTRATES;

EID: 67650617628 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3138723 Document Type: Article

Times cited : (22)

References (29)

1
- 0038174714
- 1389-5567. 10.1016/S1389-5567(00)00002-2
- A. Fujishima, T. N. Rao, and D. A. Tryk, J. Photochem. Photobiol. C 1389-5567, 1, 1 (2000). 10.1016/S1389-5567(00)00002-2
- (2000) J. Photochem. Photobiol. C , vol.1 , pp. 1
- Fujishima, A.¹ Rao, T.N.² Tryk, D.A.³

2
- 0037183946
- 0036-8075. 10.1126/science.1075035
- S. U. M. Khan, M. Al-Shahry, and W. B. Ingler, Jr., Science 0036-8075, 297, 2243 (2002). 10.1126/science.1075035
- (2002) Science , vol.297 , pp. 2243
- Khan, S.U.M.¹ Al-Shahry, M.² Ingler Jr., W.B.³

3
- 34548483001
- 0360-3199. 10.1016/j.ijhydene.2006.09.004
- J. Nowotny, T. Bak, M. K. Nowotny, and L. R. Sheppard, Int. J. Hydrogen Energy 0360-3199, 32, 2609 (2007). 10.1016/j.ijhydene.2006.09.004
- (2007) Int. J. Hydrogen Energy , vol.32 , pp. 2609
- Nowotny, J.¹ Bak, T.² Nowotny, M.K.³ Sheppard, L.R.⁴

4
- 33748431680
- 1388-2481. 10.1016/j.elecom.2006.05.033
- M. Hepel, I. Kumarihamy, and C. J. Zhong, Electrochem. Commun. 1388-2481, 8, 1439 (2006). 10.1016/j.elecom.2006.05.033
- (2006) Electrochem. Commun. , vol.8 , pp. 1439
- Hepel, M.¹ Kumarihamy, I.² Zhong, C.J.³

5
- 34247148576
- 0013-4686. 10.1016/j.electacta.2007.01.056
- M. Hepel, I. Dela, T. Hepel, J. Luo, and C. J. Zhong, Electrochim. Acta 0013-4686, 52, 5529 (2007). 10.1016/j.electacta.2007.01.056
- (2007) Electrochim. Acta , vol.52 , pp. 5529
- Hepel, M.¹ Dela, I.² Hepel, T.³ Luo, J.⁴ Zhong, C.J.⁵

6
- 0037472266
- 0254-0584. 10.1016/S0254-0584(02)00138-4
- R. S. Sonawane, S. G. Hegde, and M. K. Dongare, Mater. Chem. Phys. 0254-0584, 77, 744 (2002). 10.1016/S0254-0584(02)00138-4
- (2002) Mater. Chem. Phys. , vol.77 , pp. 744
- Sonawane, R.S.¹ Hegde, S.G.² Dongare, M.K.³

7
- 33748425426
- 0013-4651. 10.1149/1.2221866
- H. C. Yao, M. C. Chiu, W. T. Wu, and F. S. Shieu, J. Electrochem. Soc. 0013-4651, 153, F237 (2006). 10.1149/1.2221866
- (2006) J. Electrochem. Soc. , vol.153 , pp. 237
- Yao, H.C.¹ Chiu, M.C.² Wu, W.T.³ Shieu, F.S.⁴

8
- 33646437499
- 0013-4651. 10.1149/1.2191148
- K. Ui, T. Fujita, N. Koura, and F. Yamaguchi, J. Electrochem. Soc. 0013-4651, 153, C449 (2006). 10.1149/1.2191148
- (2006) J. Electrochem. Soc. , vol.153 , pp. 449
- Ui, K.¹ Fujita, T.² Koura, N.³ Yamaguchi, F.⁴

9
- 31144476931
- 0013-4686. 10.1016/j.electacta.2005.07.017
- J. Georgieva, S. Armyanov, E. Valova, I. Poulios, and S. Sotiropoulos, Electrochim. Acta 0013-4686, 51, 2076 (2006). 10.1016/j.electacta.2005.07.017
- (2006) Electrochim. Acta , vol.51 , pp. 2076
- Georgieva, J.¹ Armyanov, S.² Valova, E.³ Poulios, I.⁴ Sotiropoulos, S.⁵

10
- 0037156103
- 0040-6090. 10.1016/S0040-6090(02)00117-7
- M. Leskela and M. Ritala, Thin Solid Films 0040-6090, 409, 138 (2002). 10.1016/S0040-6090(02)00117-7
- (2002) Thin Solid Films , vol.409 , pp. 138
- Leskela, M.¹ Ritala, M.²

11
- 21244463832
- 0040-6090. 10.1016/j.tsf.2005.03.049
- H. -E. Cheng, W. -J. Lee, and C. -M. Hsu, Thin Solid Films 0040-6090, 485, 59 (2005). 10.1016/j.tsf.2005.03.049
- (2005) Thin Solid Films , vol.485 , pp. 59
- Cheng, H.-E.¹ Lee, W.-J.² Hsu, C.-M.³

12
- 4043099659
- 0935-9648. 10.1002/adma.200306296
- H. Shin, D. -K. Jeong, J. Lee, M. M. Sung, and J. Kim, Adv. Mater. (Weinheim, Ger.) 0935-9648, 16, 1197 (2004). 10.1002/adma.200306296
- (2004) Adv. Mater. (Weinheim, Ger.) , vol.16 , pp. 1197
- Shin, H.¹ Jeong, D.-K.² Lee, J.³ Sung, M.M.⁴ Kim, J.⁵

13
- 1842423017
- 0169-4332. 10.1016/j.apsusc.2003.10.053
- J. D. Ferguson, A. R. Yoder, A. W. Weimer, and S. M. George, Appl. Surf. Sci. 0169-4332, 226, 393 (2004). 10.1016/j.apsusc.2003.10.053
- (2004) Appl. Surf. Sci. , vol.226 , pp. 393
- Ferguson, J.D.¹ Yoder, A.R.² Weimer, A.W.³ George, S.M.⁴

14
- 33745545894
- 0935-9648. 10.1002/adma.200502287
- J. S. King, E. Graugnard, O. M. Roche, D. N. Sharp, J. Scrimgeour, R. G. Denning, A. J. Turberfield, and C. J. Summers, Adv. Mater. (Weinheim, Ger.) 0935-9648, 18, 1561 (2006). 10.1002/adma.200502287
- (2006) Adv. Mater. (Weinheim, Ger.) , vol.18 , pp. 1561
- King, J.S.¹ Graugnard, E.² Roche, O.M.³ Sharp, D.N.⁴ Scrimgeour, J.⁵ Denning, R.G.⁶ Turberfield, A.J.⁷ Summers, C.J.⁸

15
- 33746361814
- 1089-5647. 10.1021/jp061483h
- W. Dai, X. Wang, P. Liu, Y. Xu, G. Li, and X. Fu, J. Phys. Chem. B 1089-5647, 110, 13470 (2006). 10.1021/jp061483h
- (2006) J. Phys. Chem. B , vol.110 , pp. 13470
- Dai, W.¹ Wang, X.² Liu, P.³ Xu, Y.⁴ Li, G.⁵ Fu, X.⁶

16
- 4644356705
- 0169-4332. 10.1016/j.apsusc.2004.05.193
- L. Miao, S. Tanemura, Y. Kondo, M. Iwata, S. Toh, and K. Kaneko, Appl. Surf. Sci. 0169-4332, 238, 125 (2004). 10.1016/j.apsusc.2004.05.193
- (2004) Appl. Surf. Sci. , vol.238 , pp. 125
- Miao, L.¹ Tanemura, S.² Kondo, Y.³ Iwata, M.⁴ Toh, S.⁵ Kaneko, K.⁶

17
- 33744537226
- 0045-6535. 10.1016/j.chemosphere.2005.11.052
- M. Inagaki, R. Nonaka, B. Tryba, and A. W. Morawski, Chemosphere 0045-6535, 64, 437 (2006). 10.1016/j.chemosphere.2005.11.052
- (2006) Chemosphere , vol.64 , pp. 437
- Inagaki, M.¹ Nonaka, R.² Tryba, B.³ Morawski, A.W.⁴

18
- 33745482954
- 0734-2101. 10.1116/1.2172941
- R. Pheamhom, C. Sunwoo, and D. -H. Kim, J. Vac. Sci. Technol. A 0734-2101, 24, 1535 (2006). 10.1116/1.2172941
- (2006) J. Vac. Sci. Technol. A , vol.24 , pp. 1535
- Pheamhom, R.¹ Sunwoo, C.² Kim, D.-H.³

19
- 37549049753
- 0013-4651. 10.1149/1.2815484
- H. Kawakami, R. Ilola, L. Straka, S. Papula, J. Romu, H. Hanninen, R. Mahlberg, and M. Heikkila, J. Electrochem. Soc. 0013-4651, 155, C62 (2008). 10.1149/1.2815484
- (2008) J. Electrochem. Soc. , vol.155 , pp. 62
- Kawakami, H.¹ Ilola, R.² Straka, L.³ Papula, S.⁴ Romu, J.⁵ Hanninen, H.⁶ Mahlberg, R.⁷ Heikkila, M.⁸

20
- 55849084647
- 0300-9246.
- V. Pore, T. Kivelä, M. Ritala, and M. Leskelä, J. Chem. Soc. Dalton Trans. 0300-9246, 2008, 6467.
- J. Chem. Soc. Dalton Trans. , vol.2008 , pp. 6467
- Pore, V.¹ Kivelä, T.² Ritala, M.³ Leskelä, M.⁴

21
- 49149108320
- 0013-4651. 10.1149/1.2952659
- H. -E. Cheng and C. -C. Chen, J. Electrochem. Soc. 0013-4651, 155, D604 (2008). 10.1149/1.2952659
- (2008) J. Electrochem. Soc. , vol.155 , pp. 604
- Cheng, H.-E.¹ Chen, C.-C.²

22
- 0042420887
- 0040-6090. 10.1016/S0040-6090(03)00877-0
- D. R. G. Mitchell, D. J. Attard, and G. Triani, Thin Solid Films 0040-6090, 441, 85 (2003). 10.1016/S0040-6090(03)00877-0
- (2003) Thin Solid Films , vol.441 , pp. 85
- Mitchell, D.R.G.¹ Attard, D.J.² Triani, G.³

23
- 0017556846
- 0021-8979. 10.1063/1.323539
- H. B. Michaelson, J. Appl. Phys. 0021-8979, 48, 4729 (1977). 10.1063/1.323539
- (1977) J. Appl. Phys. , vol.48 , pp. 4729
- Michaelson, H.B.¹

24
- 0029308262
- 0042-207X. 10.1016/0042-207X(94)00104-9
- S. Jaskolka, T. Radon, E. V. Chulkov, and O. S. Koroleva, Vacuum 0042-207X, 46, 449 (1995). 10.1016/0042-207X(94)00104-9
- (1995) Vacuum , vol.46 , pp. 449
- Jaskolka, S.¹ Radon, T.² Chulkov, E.V.³ Koroleva, O.S.⁴

25
- 0000593193
- 0021-8979. 10.1063/1.362358
- H. -E. Cheng and M. -H. Hon, J. Appl. Phys. 0021-8979, 79, 8047 (1996). 10.1063/1.362358
- (1996) J. Appl. Phys. , vol.79 , pp. 8047
- Cheng, H.-E.¹ Hon, M.-H.²

26
- 0000902007
- 0959-9428. 10.1039/a802619j
- H. Zhang and J. F. Banfield, J. Mater. Chem. 0959-9428, 8, 2073 (1998). 10.1039/a802619j
- (1998) J. Mater. Chem. , vol.8 , pp. 2073
- Zhang, H.¹ Banfield, J.F.²

27
- 33645890280
- 0254-0584. 10.1016/j.matchemphys.2005.08.017
- H. -E. Cheng and W. -J. Lee, Mater. Chem. Phys. 0254-0584, 97, 315 (2006). 10.1016/j.matchemphys.2005.08.017
- (2006) Mater. Chem. Phys. , vol.97 , pp. 315
- Cheng, H.-E.¹ Lee, W.-J.²

28
- 0032205224
- 0013-4651. 10.1149/1.1838902
- I. Shiyanovskaya and M. Hepel, J. Electrochem. Soc. 0013-4651, 145, 3981 (1998). 10.1149/1.1838902
- (1998) J. Electrochem. Soc. , vol.145 , pp. 3981
- Shiyanovskaya, I.¹ Hepel, M.²

29
- 0032751902
- 0013-4651. 10.1149/1.1391593
- I. Shiyanovskaya and M. Hepel, J. Electrochem. Soc. 0013-4651, 146, 243 (1999). 10.1149/1.1391593
- (1999) J. Electrochem. Soc. , vol.146 , pp. 243
- Shiyanovskaya, I.¹ Hepel, M.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.