UVCVD silicon nitride passivation and ARC layers for multicrystalline solar cells

Solar Energy Materials and Solar Cells

Volumn 65, Issue 1, 2001, Pages 297-301

  Fourmond, Erwann ^a   Dennler, Gilles ^a   Monna, Rémi ^b   Lemiti, Mustapha ^a   Fave, Alain ^a   Laugier, André ^a  

^a INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^b Photowatt International SAS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LOW TEMPERATURE OPERATIONS; OPTICAL PROPERTIES; PASSIVATION; PHOTOCHEMICAL REACTIONS; SILICON NITRIDE;

ANTIREFLECTION; ELECTROMAGNETICALLY CASTED SILICON SOLAR CELLS; MICROWAVE PHOTOCONDUCTANCE DECAY; ULTRAVIOLET CHEMICAL VAPOR DEPOSITION;

SILICON SOLAR CELLS;

EID: 0035202560     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00105-7     Document Type: Article

References (7)

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