Studies on structural, electrical and optical properties of multiferroic (Ag, Ni and In) codoped Bi 0.9 Nd 0.1 FeO 3 thin films

Applied Surface Science

Volumn 292, Issue , 2014, Pages 702-709

  Xue, Xu ^a   Tan, Guoqiang ^a   Dong, Guohua ^a   Liu, Wenlong ^a   Ren, Huijun ^a  

^a SHAANXI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Multiferroics, Leakage current, Optical properties

Indexed keywords

BISMUTH COMPOUNDS; CHEMICAL ANALYSIS; ELECTRIC SPACE CHARGE; ENERGY GAP; FERROELECTRIC FILMS; INDIUM COMPOUNDS; INTERFACES (MATERIALS); IONS; IRON COMPOUNDS; MAGNETIZATION; NEODYMIUM COMPOUNDS; NICKEL; OPTICAL DATA PROCESSING; OPTICAL PROPERTIES; PEROVSKITE; RARE EARTHS; SILVER COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; THIN FILMS; X RAY DIFFRACTION;

BULK-LIMITED CONDUCTIONS; ELECTRICAL AND OPTICAL PROPERTIES; FERROMAGNETIC COUPLING; MAGNETICALLY ACTIVES; MULTIFERROICS; PEROVSKITE STRUCTURES; POOLE-FRENKEL EMISSION; SPACE CHARGE LIMITED CONDUCTION; BIFEO3;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84893673996     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.12.037     Document Type: Article

References (34)

1. G.A. Smolenskiy, and I.E. Chupis Sov. Phys. Usp. 25 1982 475
2. S.K. Singh, H. Ishiwara, and K. Maruyama J. Appl. Phys. 100 2006 064102
3. C.M. Raghavan, D. Do, and J.W. Kim et al. J. Am. Ceram. Soc. 95 2012 1933
4. K.G. Yang, and Y.L. Zhang et al. J. Appl. Phys. 107 2010 124109
5. F. Yan, T.J. Zhu, M.-O. Lai, and L. Lu Appl. Phys. Exp. 4 2011 111502
6. C. Ederer, and N.A. Spaldin Phys. Rev. B 71 2005 060401
7. G.L. Yuan, S.W. Or, J.M. Liu, and Z.G. Liu Appl. Phys. Lett. 89 2006 052905
8. Z.X. Cheng, A.H. Li, and X.L. Wang et al. J. Appl. Phys. 103 2008 07E507
9. P. Hermet, M. Goffinet, J. Kreisel, and Ph. Ghosez Phys. Rev. B 75 2007 220102
10. D. Kothari, V.R. Reddy, and V.G. Sathe et al. J. Magn. Magn. Mater. 320 2008 548
11. Y. Yang, J.Y. Sun, and K. Zhu et al. Physica B 404 2009 171
12. M.K. Singh, S. Ryu, and H.M. Jang Phys. Rev. B 72 2005 132101
13. Z. Quan, W. Liu, and H. Hu et al. J. Appl. Phys. 104 2008 084106
14. C. Ostos, O. Raymond, and N. Suarez-Almodovar et al. J. Appl. Phys. 110 2011 024114
15. T.S. Niedrig, W. Weiss, and R. Schlogl Phys. Rev. B 52 1995 17449
16. S.J. Clark, and J. Robertson Appl. Phys. Lett. 94 2009 022902
17. C. Rath, P. Mohanty, A.C. Pandey, and N.C. Mishra J. Phys. D: Appl. Phys. 42 2009 205101
18. H. Yang, Y.Q. Wang, H. Wang, and Q.X. Jia Appl. Phys. Lett. 96 2010 012909
19. X.H. Zhu, H. Béa, and M. Bibes et al. Appl. Phys. Lett. 93 2008 082902
20. X. Qi, J. Dho, and R. Tomov et al. Appl. Phys. Lett. 86 2005 062903
21. A. Huang, and S.R. Shannigrahi J. Alloys Compd. 509 2011 2054
22. G.W. Pabst, L.W. Martin, Y.-H. Chu, and R. Ramesh Appl. Phys. Lett. 90 2007 072902
23. X. Xue, G. Tan, H. Hao, and H. Ren Appl. Surf. Sci. 282 2013 432
24. W. Sakamoto, A. Iwata, and T. Yogo J. Appl. Phys. 104 2008 104106
25. L.H. Yin, B.C. Zhao, and J. Fang et al. J. Solid State Chem. 194 2012 194
26. G. Catalan, and J.F. Scott Adv. Mater. 21 2009 2463
27. V.R. Palkar, D.C. Kundaliya, S.K. Malik, and S. Bhattacharya Phys. Rev. B 69 2004 212102
28. Z. Yan, K.F. Wang, J.F. Qu, and Y. Wang Appl. Phys. Lett. 91 2007 082906
29. J.T. Richardson, and D.I. Yiagas et al. J. Appl. Phys. 70 1991 6977
30. L. Peng, H. Dengb, and J. Tian et al. Appl. Surf. Sci. 268 2013 146
31. P.S.V. Mocherla, and C. Karthik et al. Appl. Phys. Lett. 103 2013 022910
32. W.W. Li, J.J. Zhu, J.D. Wu, J. Gan, and Z.G. Hu Appl. Phys. Lett. 97 2010 121102
33. A. Bouaine, N. Brihi, and G. Schmerber et al. J. Phys. Chem. C 111 2007 2924
34. H. Kim, and C.H. Park J. Korean Phys. Soc. 49 2006 S477