Thickness-dependent structural and electrical properties of multiferroic Mn-doped BiFeO3 thin films grown epitaxially by pulsed laser deposition

Applied Physics Letters

Volumn 93, Issue 8, 2008, Pages

  Zhu, X H ^a,b,f   Ba H ^a,b,g   Bibes, M ^a,b   Fusil, S ^a,b   Bouzehouane, K ^a,b   Jacquet, E ^a,b   Barthlmy A ^a,b   Lebeugle, D ^c,d   Viret, M ^e   Colson, D ^e  

^a UNITÉ MIXTE DE PHYSIQUE CNRS THALES   (France)

^b UNIVERSITÉ PARIS SACLAY   (France)

^c CEA SACLAY   (France)

^d UNIVERSITÉ PARIS SUD   (France)

^e SERVICE DE PHYSIQUE DE L ETAT CONDENSÉ   (France)

^f CEA LETI   (France)

^g UNIVERSITY OF GENEVA   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH COMPOUNDS; FERROELECTRIC FILMS; FERROELECTRICITY; IRON COMPOUNDS; MANGANESE COMPOUNDS; POLARIZATION; PULSED LASER DEPOSITION; SCANNING PROBE MICROSCOPY; STRONTIUM TITANATES; TITANIUM COMPOUNDS;

CONVENTIONAL TECHNIQUES; FERROELECTRIC POLARIZATION; FERROELECTRIC PROPERTY; INSULATING PROPERTIES; PIEZORESPONSE FORCE MICROSCOPY; STRUCTURAL AND ELECTRICAL PROPERTIES; THICKNESS DEPENDENCE; TUNNELING CURRENT;

THIN FILMS;

EID: 51349092844     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2969785     Document Type: Article

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