Highly textured Sr, Nb co-doped BiFeO3 thin films grown on SrRuO3/Si substrates by rf- sputtering

Journal of Applied Physics

Volumn 110, Issue 2, 2011, Pages

  Ostos, C ^a,b   Raymond, O ^b   Suarez Almodovar, N ^c   Bueno Baques D ^d   Mestres, L ^e   Siqueiros, J M ^b  

^a INSTITUTO DE INVESTIGACIONES EN MATERIALES   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^c UNIVERSITY OF HAVANA   (Cuba)

^d CENTRO DE INVESTIGACIÓN EN QUÍMICA APLICADA   (Mexico)

^e UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE GRAIN SIZE; BFO FILMS; CO-DOPED; DEVICE STRUCTURES; FERROELECTRIC BEHAVIOR; FERROMAGNETIC RESPONSE; FIELD COOLED; FILM STRUCTURE; HIGH RESOLUTION X RAY DIFFRACTION; LEAKAGE MECHANISM; MAGNETIC INTERACTIONS; MAGNETIC PHASIS; MAGNETIZATION CURVES; MULTIFERROIC FILM; NEGATIVE BIAS; PARASITE-; POOLE-FRENKEL; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SCHOTTKY INJECTION; SPIN-FREEZING TEMPERATURE; SPIN-GLASS BEHAVIOR; SUBSTRATE LAYERS; SURFACE CHEMICAL BONDING STATE; TRAP CENTER; TRAP-LIMITED CONDUCTION; ZERO-FIELD-COOLED;

BISMUTH COMPOUNDS; CHEMICAL ANALYSIS; CHEMICAL BONDS; GRAIN GROWTH; GRAIN SIZE AND SHAPE; NIOBIUM; OXYGEN VACANCIES; PHOTOELECTRON SPECTROSCOPY; SILICON; SPIN GLASS; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROELECTRIC FILMS;

EID: 79961113443     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3610428     Document Type: Article

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