Study and optimization of the parameters governing the block copolymer self-assembly: Toward a future integration in lithographic process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

  Chevalier, X ^a,c   Tiron, R ^a   Upreti, T ^a   Gaugiran, S ^a   Navarro, C ^b   Magnet, S ^b   Chevolleau, T ^a   Cunge, G ^a   Fleury, G ^c   Hadziioannou, G ^c  

^a CEA LETI   (France)

^b ARKEMA   (France)

^c UNIVERSITÉ BORDEAUX 1   (France)

Author keywords

Block copolymer; Plasma etching; PS b PMMA; Self assembly; Surface modification

Indexed keywords

ADVANCED LITHOGRAPHY; ANNEALING TIME; ASSEMBLY PARAMETERS; BLOCK COPOLYMER FILMS; BLOCK COPOLYMER SELF-ASSEMBLY; BLOCK COPOLYMER THIN FILMS; BLOCK STRUCTURED; BULK SILICON; CMOS COMPATIBLE; CO-POLYMER SYSTEMS; DEFECT-FREE; GRAPHOEPITAXY; HIGH ASPECT RATIO; IN-PLANE; LITHOGRAPHIC PROCESS; OUT-OF-PLANE; PROCESSING CONDITION; PS-B-PMMA; SELF ASSEMBLY PROCESS; SELF-ASSEMBLED; SURFACE MODIFICATION; THIN FILM CONFIGURATION; THIN FILM MORPHOLOGY;

ASPECT RATIO; BLOCK COPOLYMERS; MORPHOLOGY; NANOSTRUCTURES; OPTIMIZATION; PLASMA ETCHING; PLASTIC PRODUCTS; POLYSTYRENES; SELF ASSEMBLY; THIN FILMS;

COPOLYMERIZATION;

EID: 79955889446     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881481     Document Type: Conference Paper

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