Self-assembly patterning using block copolymer for advanced CMOS technology: Optimisation of plasma etching process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8328, Issue , 2012, Pages

  Chevolleau, T ^a   Cunge, G ^a   Delalande, M ^a   Chevalier, X ^a   Tiron, R ^a   David, S ^a   Darnon, M ^a   Navarro, C ^b  

^a CEA LETI   (France)

^b ARKEMA   (France)

Author keywords

block copolymer; plasma etching; PS b PMMA; self assembly

Indexed keywords

ADVANCED CMOS; CRITICAL DIMENSION CONTROL; ETCHING MASKS; OPTIMISATIONS; PLASMA ETCHING PROCESS; PS-B-PMMA; SILICON ETCHING; SILICON SUBSTRATES;

BLOCK COPOLYMERS; CMOS INTEGRATED CIRCUITS; MASKS; PLASMA ETCHING; SILICON;

SELF ASSEMBLY;

EID: 84875143221     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916399     Document Type: Conference Paper

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