Predictive simulation of doping processes for silicon solar cells

Energy Procedia

Volumn 38, Issue , 2013, Pages 312-320

  Schön, Jonas ^a   Abdollahinia, Alireza ^a,b   Müller, Ralph ^a   Benick, Jan ^a   Hermle, Martin ^a   Warta, Wilhelm ^a   Schubert, Martin C ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^b UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Boron diffusion; Ion implantation; Oxidation; Phosphorus diffusion; Process simulation

Indexed keywords

EID: 84891631459     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2013.07.283     Document Type: Conference Paper

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