Simulation of the post-implantation anneal for emitter profile optimization in high efficiency c-Si solar cells

AIP Conference Proceedings

Volumn 1496, Issue , 2012, Pages 206-211

  Florakis, A ^a,b   Vandervorst, W ^a,b   Janssens, T ^a   Rosseel, E ^a   Douhard, B ^a   Delmotte, J ^a   Cornagliotti, E ^a   Baert, K ^a   Posthuma, N ^a   Poortmans, J ^a  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Boron; Emitter formation; IBC cells; Ion Implantation; PERL cells; Solar Cells; TCAD

Indexed keywords

EID: 84874215956     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.4766525     Document Type: Conference Paper

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