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Volumn 112, Issue 12, 2012, Pages
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A model for phosphosilicate glass deposition via POCl3 for control of phosphorus dose in Si
a b c d e e b a |
Author keywords
[No Author keywords available]
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Indexed keywords
GLASS;
PHOSPHORUS;
SILICA;
SILICON OXIDES;
CRYSTALLINE SILICON SOLAR CELLS;
DEACTIVATION MODEL;
EXPERIMENTAL CONDITIONS;
LINEAR PARABOLIC MODEL;
MEASURE CONCENTRATION;
PHOSPHORUS CONCENTRATION;
PHOSPHORUS DIFFUSION;
PHOSPHOSILICATE GLASS;
CHLORINE COMPOUNDS;
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EID: 84886768505
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.4771672 Document Type: Article |
Times cited : (18)
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References (13)
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