Improving the predictive power of modeling the emitter diffusion by fully including the phosphsilicate glass (PSG) layer

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2011, Pages 002957-002962

  Wagner, H ^a   Dastgheib Shirazi, A ^b   Chen, R ^c   Dunham, S T ^c   Kessler, M ^d   Altermatt, P P ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^b UNIVERSITY OF KONSTANZ   (Germany)

^c UNIVERSITY OF WASHINGTON   (United States)

^d INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION MODEL; DOPANT PROFILE; EMITTER DIFFUSION; INDUSTRIAL FABRICATION; PHOSPHOSILICATE GLASS; PRE-DEPOSITION; PREDICTION CAPABILITY; PREDICTIVE POWER; PROFILE MEASUREMENT; SELECTIVE EMITTERS; SI SURFACES;

GLASS; PHOSPHORUS; PHOTOVOLTAIC EFFECTS; SILICON;

DIFFUSION;

EID: 84861082237     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2011.6186566     Document Type: Conference Paper

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