Effect of pH on film structure and electrical property of PMMA-Au composite particles prepared by redox transmetalation

Applied Surface Science

Volumn 289, Issue , 2014, Pages 524-528

  Wu, Hong Mao ^a   Lin, Kuan Ju ^a   Yu, Yi Hsiuan ^b   Ho, Chan Yuan ^b   Wei, Ming Hsiung ^b   Lu, Fu Hsing ^a   Tseng, Wenjea J ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Electroless plating; Film; Gold; PMMA; Redox transmetalation

Indexed keywords

COMPOSITE MATERIALS; ELECTROLESS PLATING; ESTERS; FILM PREPARATION; FILMS; GOLD; SHELLS (STRUCTURES);

COMPOSITE PARTICLES; CORE-SHELL MORPHOLOGIES; PARTICULATE FILMS; PMMA; PRECURSOR SOLUTIONS; SACRIFICIAL TEMPLATES; SELECTIVE DEPOSITION; TRANSMETALATION;

GOLD NANOPARTICLES;

EID: 84890569882     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.11.028     Document Type: Article

References (35)

1. R.G. Chaudhuri, and S. Paria Chem. Rev. 112 2012 2373 2433
2. M. Agrawal, S. Gupta, and M. Stamm J. Mater. Chem. 21 2011 615 627
3. F. Caruso Adv. Mater. 13 2001 11 22
4. E. Bourgeat-Lami J. Nanosci. Nanotechnol. 2 2010 1 24
5. P.D. Cozzoli, T. Pellegrino, and L. Manna Chem. Soc. Rev. 35 2006 1195 1208
6. T. Ji, V.G. Lirtsman, Y. Avny, and D. Davidov Adv. Mater. 13 2001 1253 1256
7. A.G. Dong, Y.J. Wang, Y. Tang, N. Ren, W.L. Yang, and Z. Gao Chem. Commun. 38 2002 350 351
8. L. Wang, and D. Chen Colloid Polym. Sci. 284 2006 449 454
9. M. Chen, J. Zhou, L. Xie, G. Gu, and L. Wu J. Phys. Chem. C 111 2007 11829 11835
10. A.B.R. Mayer, W. Grebner, and R. Wannemacher J. Phys. Chem. B 104 2000 7278 7285
11. Y.-M. Jeon, M.-S. Gong, and H.-N. Cho Macromol. Res. 17 2009 2 4
12. J. Jiang, H. Lu, L. Zhang, and N. Xu Surf. Coat. Technol. 201 2007 7174 7179
13. Y. Okinaka, and M. Kato The electroless deposition of gold M. Schlesinger, M. Paunovic, Modern Electroplating fifth ed. 2010 John Wiley & Sons, Inc. New York 483 498 (Chapter 21)
14. W. Lin, T.H. Warren, R.G. Nuzzo, and G.S. Girolami J. Am. Chem. Soc. 115 1993 11644 11645
15. W. Lin, B.C. Wiegand, R.G. Nuzzo, and G.S. Girolami J. Am. Chem. Soc. 118 1996 5977 5987
16. W. Lin, B.C. Wiegand, R.G. Nuzzo, and G.S. Girolami J. Am. Chem. Soc. 118 1996 5988 5996
17. E.L. Crane, Y. You, R.G. Nuzzo, and G.S. Girolami J. Am. Chem. Soc. 122 2000 3422 3435
18. S. Gu, X. Yao, M.J. Hampden-Smith, and T.T. Kodas Chem. Mater. 10 1998 2145 2151
19. S. Gu, P. Atanasova, M.J. Hampden-Smith, and T.T. Kodas Thin Solid Films 340 1999 45 52
20. J.-I. Park, and J. Cheon J. Am. Chem. Soc. 123 2001 5743 5746
21. D. Chen, J. Li, C. Shi, X. Du, N. Zhao, J. Sheng, and S. Liu Chem. Mater. 19 2007 3399 3405
22. J.-I. Park, M.G. Kim, Y.-W. Jun, J.S. Lee, W.-R. Lee, and J. Cheon J. Am. Chem. Soc. 126 2004 9072 9078
23. W.-R. Lee, M.G. Kim, J.-R. Choi, J.-I. Park, S.J. Ko, S.J. Oh, and J. Cheon J. Am. Chem. Soc. 127 2005 16090 16097
24. D. Chen, S. Liu, J. Li, N. Zhao, C. Shi, X. Du, and J. Sheng J. Alloy. Compd. 475 2009 494 500
25. S. Sarkar, A.K. Sinha, M. Pradhan, M. Basu, Y. Negishi, and T. Pal J. Phys. Chem. C 115 2011 1659 1673
26. M. Mohl, A. Kumar, A.L.M. Reddy, A. Kukovecz, Z. Konya, I. Kiricsi, R. Vajtai, and P.M. Ajayan J. Phys. Chem. C 114 2010 389 393
27. Y. Sun, B. Wiley, Z.-Y. Li, and Y. Xia J. Am. Chem. Soc. 126 2004 9399 9406
28. L. Au, X. Lu, and Y. Xia Adv. Mater. 20 2008 2517 2522
29. S. Tokonami, Y. Yamamoto, Y. Mizutani, I. Ota, H. Shiigi, and T. Nagaoka J. Electrochem. Soc. 156 2009 D558 D563
30. Y.C. Lin, and J. Zhong J. Mater. Sci. 43 2008 3072 3093
31. K.-J. Lin, H.-M. Wu, Y.-H. Yu, C.-Y. Ho, M.-H. Wei, F.-H. Lu, and W.J. Tseng Appl. Surf. Sci. 282 2013 741 745
32. S.E. Skrabalak, J. Chen, Y. Sun, X. Lu, L. Au, C.M. Cobley, and Y. Xia Acc. Chem. Res. 41 2008 1587 1595
33. Y.A. Nechayev, and G.V. Zvonareva Geokhimiya 6 1983 919 923
34. F. Moreau, G.C. Bond, and A.O. Taylor J. Catal. 231 2005 105 114
35. C.-J. Tsai, C.-N. Chen, and W.J. Tseng J. Nanopart. Res. 13 2011 6859 6868