Chemical vapor deposition of copper-cobalt binary films

Thin Solid Films

Volumn 340, Issue 1, 1999, Pages 45-52

  Gu, Shuo ^a   Atanasova, Paolina ^a   Hampden Smith, Mark J ^b   Kodas, Toivo T ^a  

^a University of New Mexico   (United States)

^b UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY ALLOYS; CHEMICAL VAPOR DEPOSITION; COBALT; COPPER; DECOMPOSITION; FILM PREPARATION; MORPHOLOGY; STOICHIOMETRY; SUBLIMATION; TEMPERATURE;

ACETYLACETONATE; BINARY FILMS;

METALLIC FILMS;

EID: 0032624008     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01401-1     Document Type: Article

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