Mechanistic studies of CVD metallization processes: Reactions of rhodium and platinum β-diketonate complexes on copper surfaces

Journal of the American Chemical Society

Volumn 122, Issue 14, 2000, Pages 3422-3435

  Crane, Elizabeth L ^a   You, Yujian ^a   Nuzzo, Ralph G ^a   Girolami, Gregory S ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; PLATINUM COMPLEX; RHODIUM COMPLEX;

ADSORPTION; ARTICLE; CATALYSIS; DESORPTION; DISSOCIATION; LIGAND BINDING; REACTION ANALYSIS; SYNTHESIS;

EID: 0034639918     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja993653s     Document Type: Article

References (50)

1. Kodas, T. T., Hampden-Smith. M. J. Eds. The Chemistry of Metal CVD; VCH: New York, 1994 and references therein.
2. Spencer, J. T. Prog. Inorg. Chem. 1994, 41, 145-237.
3. Jensen, K. F.; Kern W. In Thin Film Processes II: Vossen, J. L., Kern, W., Eds.; Academic: Boston. 1991; Chapter III-1.
4. Jensen, K. F. In Microelectronic Processing: Chemical Engineering Aspects, (Adv. Chem. Ser 221), Hess, D. W., Jensen, K. F., Eds.; Advances in Chemistry Series 221; American Chemical Society: Washington, DC, 1989. Chapter 5.
5. Rubezhov, A. Z. Pint. Met. Rev. 1992, 36, 26-33.
6. Jeon, N. L.; Lin, W.; Erhardt, M. K.; Girolami, G. S.; Nuzzo, R. G. Langmuir 1997, 13, 3833-3838.
7. Jones, R. E.; Desu, S. B. MRS Bull. 1996, 21, 55-58.
8. Lee, J. M.; Hwang, C. S.; Cho, H.-J.: Suk, C.-G.: Kim, H. J. J. Electrochem. Soc. 1998. 145, 1066-1069.
9. Jeon, N. L.; Clem, P.; Jung. D. Y.; Lin. W.; Girolami. G. S.; Payne, D. A.; Nuzzo, R. G. Adv. Mater. 1997, 9, 891-895.
10. Rand, M. J. J. Electrochem. Sac. 1973, 120, 686-693.
11. Morabito, J. M.; Rand, M. J. Thin Solid Films 1974, 22, 293-303.
12. Garrido-Suarez, C.; Braichotle, D.; van der Bergh, H. Appl. Phys. A 1988, 46, 285-290.
13. Braichotte, D.; van der Bergh. H. Appl. Phyx. A 1987, 44, 353-359.
14. Gilgen, H. H.; Cacouris. T.; Shaw, P. S.: Krchnavek, R. R.: Osgood, R. M. Appl. Phys. B 1987, 42, 55-66.
15. Gozum. J. E.: Rogers. D. M.: Jensen. J. A.; Girolami, G. S. J. Am. Chem. See. 1988. 110. 2688-2689.
16. Xue. Z.; Strouse. M. J.: Shun. D. K.; Knohler. C. B.; Kaesz. H. D.: Hicks, R. F.; Williams. R S. J. Am. Chem. Sot: 1989, 111, 8779-8784.
17. Dryden. N. H.; Kumar, R.: Ou, E.; Rashidi, M.; Roy. S.; Norton. P. R.: Puddephatt. R. J. Chem. Mater. 1991, 3, 677-685.
18. Xue, Z.; Thridandam. H.; Kaesz, H. D.; Hicks. R. F. Chem. Muter. 1992, 4, 162-166.
19. ( 19) Dossi, C.; Psaro, R.: Bartsch. A ; Brivio, E.: Galasco, A.; Losi. P. Calal. Today 1993. 17. 527-535.
20. Igumenov. I. K. J. Pins. IV 1995. 5. C5/489-C5/496.
21. (21 ) Fusy. J.; Menaucourt, J.; Alnot, M.: Huguet, C.; Ehrhardt. J. J. Appl. Surf. Sei. 19%, 93. 211-220.
22. Lin. W.: Warren, T. H.; Nuzzo, R. G.: Girolami. G. S. J. Am. Chem. Soi: 1993, 115. 11644.
23. Lin. W.; Wiegand. B. C.; NUO, R. G.; Girolami. G. S. J. Am. Chem. Soc. 1996, 118, 5977-5987.
24. Lin. W.; Nuzo. R. G.: Girolami. G. S. J. Am. Chem. Soc. 1996. 118. 59X8-5996.
25. Lin, W.: Warren. T. H.; Wilson. S. R.; Girolami. G. S., submitted for publication.
26. Lin. W.; Girolami, G. S., in preparation.
27. You, Y ; Girolami, G. S., in preparation.
28. Hosteller, M. J.; Nuzzo. R. G.; Girolami. G. S.; Dubois, L. H. J. PAv.v. Chem. 1994. 98. 2952-2962.
29. '(29) Bent. B. E.: Nuzzo. R. G.: Dubois. L. H. / Am. Chem. Sm: 1989. 111. 1634-1644.
30. See, for example: Nuzzo, R. G.: Zegarski, B. R.: Korenic. E. M.: Duhois. L. H. J. Phys. Chem. 1992, 96, 1355-1361.
31. Aneja, R.; Golding, B. T.; Pierpoint.C. J Chem. Soc., Dation Trans. 1984, 219-224.
32. Okeya, S.; Kawaguchi. S. Inorg. Synth. 1982, 20, 65-69.
33. Eight Peak Index of Mass Spectra. 3rd ed.: Royal Society of Chemistry: London, 1983.
34. Jenks, C. J.; Bent, B. E.; Bernstein, N.: Zaera, F. Surf. Sci. Lett. 1992, 227, L89-L94.
35. Girolami, G. S.: Jeffries. P. M.; Duhois. L. H. J. Am. Chem. Soc. 1993, 115, 1015-1024.
36. Redhead, P. A. Vacuum 1962, 12, 203-211.
37. Powell, C. J. Crit. Rev. Surf. Chem. 1993, 2, 17-35.
38. Hercules, D. M. Crit. Rev. Surf. Chem. 1992, 1, 243-277.
39. Amlerson, S. L.: Watters, K. L.; Howe. R. F. J. Catal. 1979, 59, 340-356.
40. Frederick. B. G.; Apai. G.: Rhodin, T. N. J. Am. Chem. Soc. 1987, 109, 4797-4803.
41. Duhois. L. H.; Jeffries. P. M.; Girolami. G. S. In Advanced Metaliyition for ULSI Applications: Rana, V. S.. Joshi, R. V.. Ohdomari. I.. Eds.: Materials Research Society: Pittsburgh. 1992: pp 375-382.
42. Cohen, S. L.: Liehr, M.; Kasi, S. Appl. Phys. Lett. 1992, 60, 50-52.
43. Laihinis, P. W.; Bain. C. D.; Nuzzo, R. G.; Whitesides, G. M. J. Phys. Chem. 1995, 99, 7663-7676.
44. Moulder, J. F.; Stickle, W. F.; Sobol, P. E.; Bomben, K. D. Handboot of X-ray Photoelectron Spectroscopy, Perkin-Elmer: Eden Prairie. MN, 1992.
45. 5/2) peak must be used to gauge the oxidation state of platinum.
46. Escard, J.; Pontvianne. B.; Chenebaux. M. T.: Cosyns. J. Bull. Soc. Chim. Fr. 1975, 112. 2399-2402.
47. A similar redox transmetalation reaction is used to deposit tungsten on silicon: WF6 reacts with the Si substrate to afford W and SiF4. Wang. J.-T.; Cao, C.-B.; Wang, H.: Zhang. S.-L. J. Electrochem. Soc. 1994, 141, 2192-2198.
48. Harris, D. C. In Quanlilalire Chemical Anahsis. 3rd ed.; Freeman: New York, 1991: pp AP34-AP43.
49. Helm. L.: Elding, L. I.; Marbach, A. E. Inorg. Chem. 1985, 24, 1719-1721.
50. Butrymowicz, D. B.; Manning, J. R.; Read. M. E. J. Phys. Chem. Ref. Data 1976, 5, 103-200.