Influence of atomic layer deposition temperatures on TiO2/n-Si MOS capacitor

ECS Journal of Solid State Science and Technology

Volumn 2, Issue 5, 2013, Pages

  Wei, D ^a   Hossain, T ^a   Garces, N Y ^b   Nepal, N ^b   Meyer III, H M ^c   Kirkham, M J ^c   Eddy Jr , C R ^b   Edgar, J H ^a  

^a Kansas State University   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84889781757     PISSN: 21628769     EISSN: 21628777     Source Type: Journal    
DOI: 10.1149/2.010305jss     Document Type: Article

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