The deposition of nanocrystalline TiO2 thin film on silicon using Sol-Gel technique and its characterization

Microelectronic Engineering

Volumn 87, Issue 3, 2010, Pages 447-450

  Kumar, Mukesh ^a,b   Kumar, Dinesh ^a  

^a KURUKSHETRA UNIVERSITY   (India)

^b KURUKSHETRA UNIVERSITY   (India)

Author keywords

Sol Gel; Spin coating; Titanium dioxide; X ray diffraction

Indexed keywords

ANATASE TIO; CAPACITANCE VOLTAGE MEASUREMENTS; DIELECTRIC CONSTANTS; GRAIN SIZE; NANOCRYSTALLINE TIO; RAMAN CHARACTERIZATION; RAMAN SPECTRA; SCHERRER'S FORMULA; SOL-GEL SPIN COATING; SOL-GEL TECHNIQUE; TIO; XRD;

CAPACITANCE; COATINGS; DIFFRACTION; GELS; GRAIN SIZE AND SHAPE; OXIDES; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; SEMICONDUCTING SILICON COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SPIN DYNAMICS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; VOLTAGE MEASUREMENT; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

SOLS;

EID: 74449088535     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.08.025     Document Type: Article

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