메뉴 건너뛰기




Volumn 52, Issue 11 PART 2, 2013, Pages

Properties of WO3-x electrochromic thin film prepared by reactive sputtering with various post annealing temperatures

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED THIN FILMS; COLORATION EFFICIENCIES; CRYSTALLINE PROPERTIES; ELECTROCHROMIC PROPERTIES; FACING TARGETS SPUTTERING; OXYGEN FLOW RATIOS; POST-ANNEALING TEMPERATURE; X RAY DIFFRACTOMETERS;

EID: 84889043986     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.52.11NB09     Document Type: Conference Paper
Times cited : (12)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.