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Volumn 52, Issue 11 PART 2, 2013, Pages
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Properties of WO3-x electrochromic thin film prepared by reactive sputtering with various post annealing temperatures
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Author keywords
[No Author keywords available]
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Indexed keywords
AS-DEPOSITED THIN FILMS;
COLORATION EFFICIENCIES;
CRYSTALLINE PROPERTIES;
ELECTROCHROMIC PROPERTIES;
FACING TARGETS SPUTTERING;
OXYGEN FLOW RATIOS;
POST-ANNEALING TEMPERATURE;
X RAY DIFFRACTOMETERS;
ANNEALING;
CYCLIC VOLTAMMETRY;
ITO GLASS;
THIN FILMS;
FILM PREPARATION;
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EID: 84889043986
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.7567/JJAP.52.11NB09 Document Type: Conference Paper |
Times cited : (12)
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References (30)
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