Comparison of electrochromic amorphous and crystalline electron beam deposited WO3 thin films

Current Applied Physics

Volumn 9, Issue 1, 2009, Pages 73-79

  Joraid, A A ^a  

^a TAIBAH UNIVERSITY   (Saudi Arabia)

Author keywords

AFM; Annealing effect; Electrochromic properties; Thin films; Tungsten oxide

Indexed keywords

TUNGSTEN COMPOUNDS;

AFM; ANNEALING EFFECT; ELECTROCHROMIC PROPERTIES; THIN FILMS; TUNGSTEN OXIDE;

TUNGSTEN;

EID: 51249096097     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2007.11.012     Document Type: Article

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