Thin film properties by facing targets sputtering system

Applied Surface Science

Volumn 169-170, Issue , 2001, Pages 410-414

  Kim, Kyung Hwan ^a   Son, In Hwan ^b   Song, Ki Bong ^c   Kong, Sok Hyun ^a   Keum, Min Jong ^a   Nakagawa, Shigeki ^d   Naoe, Masahiko ^d  

^a Gachon University College of Medicine   (South Korea)

^b Shinsung University   (South Korea)

^c Kolon Industries Inc   (South Korea)

^d TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; ELECTRIC DISCHARGES; FILM PREPARATION; MAGNETIC RECORDING; PRESSURE EFFECTS; SPUTTER DEPOSITION; THIN FILMS;

FACING TARGET SPUTTERING (FTS) SYSTEMS;

METALLIC FILMS;

EID: 18344398194     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00694-2     Document Type: Article

References (3)

1. N. Matsushita, K. Noma, S. Nakagawa, M. Naoe, ICF-6, 1992, pp. 428-431.
2. Takada S. J. Appl. Phys. 73:1993;4739.
3. Park Y.W., Yoon S.J., Park C.Y. J. KIEEME. 11(10):1998;833-841.