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Volumn 1, Issue , 2003, Pages 28-31
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Quantum mechanical modeling of advanced sub-10 nm MOSFETs
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Author keywords
CMOS technology; Electrodes; Electrons; Electrostatics; Joining processes; MOSFETs; Numerical models; Poisson equations; Quantum mechanics; Semiconductor device modeling
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
ELECTRODES;
ELECTRONS;
ELECTROSTATICS;
MOS DEVICES;
NANOTECHNOLOGY;
NUMERICAL MODELS;
POISSON EQUATION;
QUANTUM THEORY;
SEMICONDUCTOR DEVICE MODELS;
SEMICONDUCTOR DEVICES;
SENSITIVITY ANALYSIS;
TRANSISTORS;
CMOS TECHNOLOGY;
GATE VOLTAGE THRESHOLD;
INTRINSIC CHANNEL;
JOINING PROCESS;
MOSFETS;
QUANTUM MECHANICAL MODEL;
SELF-CONSISTENT SOLUTION;
TRANSISTOR PARAMETERS;
MOSFET DEVICES;
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EID: 84888917407
PISSN: 19449399
EISSN: 19449380
Source Type: Conference Proceeding
DOI: 10.1109/NANO.2003.1231706 Document Type: Conference Paper |
Times cited : (5)
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References (20)
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